⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3938762 | 0.81 | — | — | |
| SCHEMBL4032398 | 0.79 | — | — | |
| SCHEMBL5473399 | 0.78 | — | — | |
| SCHEMBL7559313 | 0.77 | — | — | |
| SCHEMBL7556809 | 0.77 | — | — | |
| SCHEMBL7554653 | 0.77 | — | — | |
| SCHEMBL7559652 | 0.77 | — | — | |
| SCHEMBL7556898 | 0.77 | — | — | |
| SCHEMBL3933765 | 0.77 | — | — | |
| SCHEMBL7552909 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1276012-B1 | Resist patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-6878508-B2 | Resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-12 | — | — | US | disclosed |
| US-6830866-B2 | Hydrogenated product of ring- opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance | SHI-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-14 | — | — | US | disclosed |
| US-20030108819-A1 | Resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-12 | — | — | US | disclosed |
| US-20030013039-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (US) | 2003-01-16 | — | — | US | disclosed |
| EP-1276012-A2 | Resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-15 | — | — | EP | disclosed |