SCHEMBL6350663

SCHEMBL6350663

CCC(C)(C)C(=O)OCCCCC(=O)OC1(C2CCCC(C)C2)C2CC3CC(C2)CC1C3

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 14/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6354815 0.87 EPHX2 (0.32) EPHX2
SCHEMBL2607740 0.86 HMGCR (0.31)
SCHEMBL2607798 0.84
SCHEMBL6353745 0.82 HMGCR (0.34)
SCHEMBL10136410 0.82 TSHR (0.36) EPHX2
SCHEMBL13779573 0.79 EPHX2 (0.39) EPHX2
SCHEMBL13231687 0.77 EPHX2 (0.37) EPHX2
SCHEMBL2607801 0.76 HMGCR (0.35)
SCHEMBL13609227 0.76 EPHX2 (0.35) EPHX2
SCHEMBL107997 0.76 CYP17A1 (0.38) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-20120115082-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-10 US disclosed