⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL395137 | 0.80 | — | — | |
| SCHEMBL12487228 | 0.80 | — | — | |
| SCHEMBL12486990 | 0.80 | — | — | |
| SCHEMBL12485909 | 0.77 | — | — | |
| SCHEMBL12486779 | 0.77 | — | — | |
| SCHEMBL12486864 | 0.77 | — | — | |
| SCHEMBL12486823 | 0.77 | — | — | |
| SCHEMBL8573344 | 0.74 | — | — | |
| SCHEMBL396890 | 0.74 | — | — | |
| SCHEMBL18243185 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220069354-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2022-03-03 | — | — | US | disclosed |
| EP-3904337-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | FUJIFILM Wako Pure Chemical Corporation (JP) | 2021-11-03 | — | — | EP | disclosed |
| CN-113166043-A | Electrolyte for sulfur-based magnesium battery | 富士胶片和光纯药株式会社 | 2021-07-23 | — | — | CN | disclosed |
| WO-2020138377-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | 富士フイルム和光純薬株式会社 | 2020-07-02 | — | — | WO | disclosed |
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| US-20160342084-A1 | ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-9200093-B2 | Polymerization method using surfactant-containing particle | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20140288251-A1 | POLYMERIZATION METHOD USING SURFACTANT-CONTAINING PARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-25 | — | — | US | disclosed |
| WO-2013085074-A1 | POLYMERIZATION METHOD USING SURFACTANT-CONTAINING PARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-06-13 | — | — | WO | disclosed |
| WO-2013047891-A2 | WASHING METHOD, ADDITION POLYMERIZATION METHOD, PREPOLYMERIZATION METHOD, PREPOLYMERIZED CATALYTIC COMPONENT FOR ADDITION POLYMERIZATION, AND METHOD FOR PRODUCING ADDITION POLYMER USING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-04 | — | — | WO | disclosed |
| WO-2012118233-A1 | ADDITION POLYMERIZATION METHOD, PREPOLYMERIZED CATALYTIC COMPONENT FOR ADDITION POLYMERIZATION, AND METHOD FOR PRODUCING ADDITION POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-09-07 | — | — | WO | disclosed |
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |