SCHEMBL6354701

SCHEMBL6354701

CCC(C)(C)C(=O)OCCCCC(=O)OC1(C2CC3CCC2C3)C2CC3CC1CC(C)(C3)C2

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 10/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2607771 0.88 EPHX2 (0.31) EPHX2
SCHEMBL6353962 0.86 EPHX2 (0.35) EPHX2
SCHEMBL10136421 0.84 EPHX2 (0.35) EPHX2
SCHEMBL13231692 0.81 EPHX2 (0.36) EPHX2
SCHEMBL6354815 0.79 EPHX2 (0.32) EPHX2
SCHEMBL6354212 0.79 HMGCR (0.32)
SCHEMBL13231696 0.78 EPHX2 (0.33) EPHX2
SCHEMBL14489179 0.76 EPHX2 (0.37) EPHX2
SCHEMBL2607836 0.76 EPHX2 (0.33) EPHX2
SCHEMBL12783005 0.76 EPHX2 (0.36) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-20120115082-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-10 US disclosed