SCHEMBL6355405

SCHEMBL6355405

CC(C)(C)OC(=O)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.63
CA1 P00915 1/20 0.63
CA2 P00918 1/20 0.63
CA9 Q16790 1/20 0.63
CA14 Q9ULX7 1/20 0.63
PDCD1 Q15116 1/20 0.58
CD274 Q9NZQ7 1/20 0.58
ABCG2 Q9UNQ0 1/20 0.55
SMN1; SMN2 Q16637 3/20 0.54
MAPT P10636 2/20 0.53
ALDH1A1 P00352 1/20 0.52
TSHR P16473 1/20 0.52
HSD17B10 Q99714 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
KDM4E B2RXH2 1/20 0.50
EGFR P00533 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.48
USP30 Q70CQ3 1/20 0.48
GRM6 O15303 1/20 0.48
FASN P49327 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2076830 0.94 CA12 (0.65) CA12CA1CA2CA9CA14
SCHEMBL6350965 0.92 CA12 (0.71) CA12CA1CA2CA9CA14
Hydrogen Sulfide SCHEMBL27727970 0.90 CA12 (0.53) CA12CA1CA2CA9CA14
SCHEMBL28719728 0.88 TSHR (0.60) CA12CA1CA2CA9CA14
Hydrogen Peroxide SCHEMBL28425777 0.88 TDP1 (0.64) CA12CA1CA2CA9CA14
SCHEMBL260960 0.88 TDP1 (0.64) CA12CA1CA2CA9CA14
SCHEMBL29199324 0.88 TDP1 (0.64) CA12CA1CA2CA9CA14
Hydrogen Peroxide SCHEMBL28474133 0.88 TDP1 (0.64) CA12CA1CA2CA9CA14
Hydrochloric Acid SCHEMBL23276979 0.86 TDP1 (0.62) CA12CA1CA2CA9CA14
SCHEMBL19895794 0.86 TDP1 (0.62) CA12CA1CA2CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040076905-A1 Onium salts and positive resist materials using the same YAGIHASHI FUJIO (JP) 2004-04-22 US claimed
US-20030096189-A1 ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME YAGIHASHI FUJIO (JP) 2003-05-22 US claimed
EP-0615163-B1 Positive resist material using particular onium salts SHINETSU CHEMICAL CO (JP) 1999-12-29 EP claimed
EP-0615163-A1 Onium salts and positive resist materials using the same Shin-Etsu Chemical Co., Ltd. (JP) 1994-09-14 EP claimed
WO-2026102082-A1 ALKYLPHENYL SUBSTITUTED COMPOUNDS, COMPOSITIONS AND METHODS OF USE DEEP APPLE THERAPEUTICS, INC. (US) 2026-05-15 WO disclosed
US-20230192673-A1 Compounds STEP PHARMA S.A.S. (FR) 2023-06-22 US disclosed
US-20230192673-A1 Compounds STEP PHARMA S.A.S. (FR) 2023-06-22 US disclosed
US-20230183229-A1 Compounds SYGNATURE DISCOVERY LIMITED (GB) 2023-06-15 US disclosed
US-20230183229-A1 Compounds SYGNATURE DISCOVERY LIMITED (GB) 2023-06-15 US disclosed
CN-115141072-A Preparation method of biphenyl and derivatives thereof 江苏师范大学 2022-10-04 CN disclosed
CN-115087658-A Sulfonamide or sulfenamide compounds having BRD 4-inducing proteolytic activity, and pharmaceutical use thereof 田边三菱制药株式会社 2022-09-20 CN disclosed
US-20210380575-A1 COMPOUNDS SYGNATURE DISCOVERY LIMITED (GB) 2021-12-09 US disclosed
US-6841334-B2 Onium salts and positive resist materials using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-01-11 US disclosed
US-20040076905-A1 Onium salts and positive resist materials using the same YAGIHASHI FUJIO (JP) 2004-04-22 US disclosed
US-6667415-B1 Dissolution inhibitors; sensitivity, resolution, process-ability; preservation stability SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-23 US disclosed
US-20030096189-A1 ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME YAGIHASHI FUJIO (JP) 2003-05-22 US disclosed
EP-0615163-B1 Positive resist material using particular onium salts SHINETSU CHEMICAL CO (JP) 1999-12-29 EP disclosed
EP-0646568-B1 Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same SHINETSU CHEMICAL CO (JP) 1998-12-23 EP disclosed
EP-0646568-A2 Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-04-05 EP disclosed
EP-0615163-A1 Onium salts and positive resist materials using the same Shin-Etsu Chemical Co., Ltd. (JP) 1994-09-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230183229-A1 Compounds UGT1A1, CYP1A1, CYP1B1 CA12 247/4885CA1 804/4885CA2 2365/4885
US-20210380575-A1 COMPOUNDS UGT1A1, CYP1A1, CYP1B1 CA12 247/4885CA1 804/4885CA2 2365/4885
US-20230192673-A1 Compounds CYP1A1, UGT1A1, CYP1A2 CA12 195/4885CA1 629/4885CA2 2011/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.