SCHEMBL6359152

SCHEMBL6359152

CC(C)(C)c1ccc(C[SiH](Cc2ccc(C(C)(C)C)c3c2CC=C3)[Zr](Cl)Cl)c2c1C=CC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6358811 0.76
SCHEMBL8962424 0.74
SCHEMBL6352497 0.72
SCHEMBL7464401 0.70
SCHEMBL8014206 0.69
SCHEMBL8587969 0.68
SCHEMBL7464155 0.62
Hydrochloric Acid SCHEMBL8587967 0.61
SCHEMBL6911502 0.60 MAOB (0.30)
SCHEMBL7464161 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6844398-B2 Ethylenic copolymer, composition containing said copolymer, and ethylenic copolymer film IDEMITSU KOSAN CO., LTD. (JP) 2005-01-18 US disclosed
US-20020188087-A1 Ethylenic copolymer, composition containing said copolymer, and ethylenic copolymer film IDEMITSU KOSAN CO., LTD. (JP) 2002-12-12 US disclosed
US-6441116-B1 FILM FORMED FROM AN ETHYLENIC COPOLYMER WHICH HAS A NARROW MOLECULAR WEIGHT DISTRIBUTION AND A NARROW BRANCHING DEGREE DISTRIBUTION AND HAS A CONTROLLED COMPOSITIONAL DISTRIBUTION PROFILE, TEAR STRENGTH, HEAT SEALING IDEMITSU KOSAN CO., LTD. (JP) 2002-08-27 US disclosed