SCHEMBL636210

SCHEMBL636210

O=C=NCc1ccc2cc(CN=C=O)ccc2c1

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.35
CYP3A4 P08684 2/20 0.35
TSHR P16473 1/20 0.35
CYP2A6 P11509 1/20 0.35
MIF P14174 7/20 0.34
TRPA1 O75762 2/20 0.33
PYCR1 P32322 1/20 0.33
ASIC3 Q9UHC3 1/20 0.32
PTGS1 P23219 1/20 0.32
AKR1C3 P42330 1/20 0.32
AKR1C2 P52895 1/20 0.32
KDM4E B2RXH2 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HPGD P15428 1/20 0.31
HTR2A P28223 1/20 0.31
HTR2C P28335 1/20 0.31
HTR2B P41595 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29799862 1.00 CYP1A2 (0.35) CYP1A2CYP3A4TSHRCYP2A6MIF
SCHEMBL31417957 0.92 CYP1A2 (0.48) CYP1A2CYP2A6PYCR1HTR2AHTR2C
SCHEMBL3722387 0.92 CYP1A2 (0.48) CYP1A2CYP2A6PYCR1HTR2AHTR2C
SCHEMBL3723399 0.90 CYP1A2 (0.42) CYP1A2CYP3A4CYP2A6PYCR1TDP1
SCHEMBL21089 0.83 MIF (0.44) CYP1A2CYP3A4TSHRMIFTRPA1
Water SCHEMBL14972874 0.80 MIF (0.43) CYP3A4TSHRMIFTRPA1ALDH1A1
Water SCHEMBL29040332 0.80 MIF (0.43) CYP3A4TSHRMIFTRPA1ALDH1A1
SCHEMBL22471901 0.80 MIF (0.43) CYP3A4TSHRMIFTRPA1ALDH1A1
SCHEMBL6437951 0.80 MIF (0.44) CYP1A2CYP3A4TSHRMIFTRPA1
SCHEMBL5465655 0.79 MIF (0.47) CYP1A2CYP3A4TSHRMIFTRPA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US claimed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO claimed
WO-2023147792-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2023-08-10 WO claimed
US-6130307-A POLY(THIO)URETHANES MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2000-10-10 US claimed
EP-4714937-A1 METHOD FOR PRODUCING TETRAFUNCTIONAL THIOL WITH EPISULFIDE RESIN AS STARTING MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-25 EP disclosed
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US disclosed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO disclosed
WO-2023147792-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2023-08-10 WO disclosed
US-20230129765-A1 METHOD FOR PRODUCING POLYTHIOETHER COMPOUND DAICEL CORPORATION (JP) 2023-04-27 US disclosed
EP-2949677-B1 NON-HOT-MELT 2,4-TDI-BASED POLYURETHANE COMPOSITION BEARING NCO END GROUPS AND HAVING A LOW CONTENT OF TDI MONOMER, COMPRISING AT LEAST ONE ISOCYANATE COMPOUND OF PARTICULAR MOLAR VOLUME BOSTIK SA (FR) 2023-03-08 EP disclosed
EP-2949676-B1 NON-HOT-MELT MDI-BASED POLYURETHANE COMPOSITION BEARING NCO END GROUPS AND HAVING A LOW CONTENT OF MDI MONOMER, COMPRISING AT LEAST ONE ISOCYANATE COMPOUND OF PARTICULAR MOLAR VOLUME BOSTIK SA (FR) 2023-02-22 EP disclosed
EP-2949676-B1 NON-HOT-MELT MDI-BASED POLYURETHANE COMPOSITION BEARING NCO END GROUPS AND HAVING A LOW CONTENT OF MDI MONOMER, COMPRISING AT LEAST ONE ISOCYANATE COMPOUND OF PARTICULAR MOLAR VOLUME BOSTIK SA (FR) 2023-02-22 EP disclosed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed
EP-1316819-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-04 EP disclosed
US-6472495-B1 RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-10-29 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed
US-6130307-A POLY(THIO)URETHANES MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2000-10-10 US disclosed
EP-0936233-A2 Composition for a resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-18 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF PARG, C5, TAF1 CYP1A2 508/4885CYP3A4 694/4885TSHR 3763/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.