Bromide

Bromide

SCHEMBL636397

CC[S+](CC)CC.[Br-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL34293 0.94
Fluoride Ion SCHEMBL4618004 0.89
Water SCHEMBL2003588 0.89
Hydrochloric Acid SCHEMBL965724 0.89
Iodide SCHEMBL394054 0.89
SCHEMBL9496992 0.80
Hydrochloric Acid SCHEMBL3388948 0.80
SCHEMBL385085 0.77
Hypophosphorous Acid SCHEMBL9464117 0.71
SCHEMBL9464112 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12509632-B2 Treatment liquid for semiconductors and method for producing same TOKUYAMA CORPORATION (JP) 2025-12-30 US disclosed
CN-120060857-A Treatment liquid for ruthenium semiconductor and method for producing same 株式会社德山 2025-05-30 CN disclosed
US-12247299-B2 Treatment liquid for semiconductor with ruthenium and method of producing the same TOKUYAMA CORPORATION (JP) 2025-03-11 US disclosed
CN-114466951-B Treatment liquid for ruthenium semiconductor and method for producing same 株式会社德山 2025-02-28 CN disclosed
US-12195658-B2 Treatment liquid for semiconductor wafers TOKUYAMA CORPORATION (JP) 2025-01-14 US disclosed
WO-2024146848-A1 CURABLE MATERIALS BASED ON CYCLIC THIOETHER COMPOUNDS, AND USES THEREOF DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) 2024-07-11 WO disclosed
EP-4023791-B1 SEMICONDUCTOR TREATMENT LIQUID FOR RUTHENIUM AND METHOD FOR PRODUCING SAME TOKUYAMA CORP (JP) 2023-10-11 EP disclosed
US-20230257887-A1 TREATMENT LIQUID FOR SEMICONDUCTOR WITH RUTHENIUM AND METHOD OF PRODUCING THE SAME TOKUYAMA CORPORATION (JP) 2023-08-17 US disclosed
US-11674230-B2 Treatment liquid for semiconductor with ruthenium and method of producing the same TOKUYAMA CORPORATION (JP) 2023-06-13 US disclosed
CN-116057208-A Treatment liquid for semiconductor wafer 株式会社德山 2023-05-02 CN disclosed
EP-0644955-A4 METHOD FOR PREPARING ORGANIC AND INORGANIC HYDROXIDES AND ALKOXIDES BY ELECTROLYSIS. SACHEM INC (US) 1995-09-27 EP disclosed
EP-0644955-A1 METHOD FOR PREPARING ORGANIC AND INORGANIC HYDROXIDES AND ALKOXIDES BY ELECTROLYSIS Sachem, Inc. (US) 1995-03-29 EP disclosed
WO-1994024335-A1 METHOD FOR PREPARING ORGANIC AND INORGANIC HYDROXIDES AND ALKOXIDES BY ELECTROLYSIS SACHEM, INC. (US) 1994-10-27 WO disclosed
US-5286354-A With reducing agent in acidic anolyte to prevent accumulation of halogen SACHEM, INC. (US) 1994-02-15 US disclosed
US-5227510-A 2-Hydroxypyridine Complexes MITSUBISHI KASEI CORPORATION (JP) 1993-07-13 US disclosed
EP-0532861-A1 Method for producing a carbonic acid ester Mitsubishi Chemical Corporation (JP) 1993-03-24 EP disclosed
EP-0073379-B1 COMPLEX SALTS WITH INCREASED ELECTRICAL CONDUCTIVITY BAYER AG (DE) 1986-08-13 EP disclosed
US-4478751-A Complex salts having high electric conductivity BAYER AKTIENGESELLSCHAFT (DE) 1984-10-23 US disclosed
EP-0073379-A1 Complex salts with increased electrical conductivity BAYER AG (DE) 1983-03-09 EP disclosed
US-4123330-A Color diffusion transfer process using benzyl alcohol and derivatives thereof KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1978-10-31 US disclosed