Trientine

Trientine

SCHEMBL6364948

C1CCCCC1.NCCNCCNCCN.O=[PH](O)O

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.55
CA6 P23280 5/20 0.55
CA7 P43166 5/20 0.55
CA9 Q16790 5/20 0.55
CA14 Q9ULX7 5/20 0.55
CA5B Q9Y2D0 5/20 0.55
CA2 P00918 4/20 0.55
CA4 P22748 4/20 0.55
CA5A P35218 4/20 0.55
LMNA P02545 3/20 0.55
CA3 P07451 3/20 0.55
ALOX15 P16050 3/20 0.55
TDP1 Q9NUW8 2/20 0.55
CA1 P00915 2/20 0.55
ALDH1A1 P00352 1/20 0.55
TP53 P04637 1/20 0.55
KDM4E B2RXH2 1/20 0.52
MEN1 O00255 2/20 0.50
RECQL P46063 2/20 0.50
KMT2A Q03164 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphonic Acid SCHEMBL6247541 0.97 CA12 (0.53) CA12CA6CA7CA9CA14
Cyclopentane SCHEMBL124978 0.97 CA12 (0.53) CA12CA6CA7CA9CA14
Phosphonic Acid SCHEMBL5902929 0.97 CA12 (0.53) CA12CA6CA7CA9CA14
Cyclopentane SCHEMBL6404767 0.95 CA12 (0.50) CA12CA6CA7CA9CA14
Trientine SCHEMBL10411239 0.92 CA12 (0.65) CA12CA6CA7CA9CA14
Trientine SCHEMBL31194270 0.90 CA12 (0.61) CA12CA6CA7CA9CA14
Phosphonic Acid SCHEMBL6544748 0.89 CA12 (0.62) CA12CA6CA7CA9CA14
Phosphonic Acid SCHEMBL7029915 0.89 CA12 (0.62) CA12CA6CA7CA9CA14
Trientine SCHEMBL6369346 0.87 CA12 (0.58) CA12CA6CA7CA9CA14
Cyclopentane SCHEMBL537739 0.86 CA12 (0.46) CA12CA6CA7CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116986741-A Composition for salt anticaking agent, salt anticaking agent and application of salt anticaking agent 常州市科净环保科技有限公司 2023-11-03 CN claimed
CN-116924467-A Method for preparing high-purity vanadium product based on electrochemical vanadium precipitation 中国科学院金属研究所 2023-10-24 CN claimed
CN-113683637-A Preparation method of polyene phosphatidylcholine 海思科制药(眉山)有限公司 2021-11-23 CN claimed
CN-117904634-A High-temperature-resistant semiconductor platinum etching solution, and preparation method and application thereof 浙江奥首材料科技有限公司 2024-04-19 CN disclosed
CN-117904632-A Semiconductor titanium etching solution, and preparation method and application thereof 浙江奥首材料科技有限公司 2024-04-19 CN disclosed
CN-117305963-A Electrolytic slurry for 3D printing metal component and inner cavity polishing thereof and polishing process 中国科学院金属研究所 2023-12-29 CN disclosed
CN-116986741-A Composition for salt anticaking agent, salt anticaking agent and application of salt anticaking agent 常州市科净环保科技有限公司 2023-11-03 CN disclosed
CN-116924467-A Method for preparing high-purity vanadium product based on electrochemical vanadium precipitation 中国科学院金属研究所 2023-10-24 CN disclosed
CN-114164521-B Flame-retardant polyacrylonitrile composite fiber with sheath-core structure, and preparation method and application thereof 天津工业大学 2023-06-16 CN disclosed
CN-111303207-B Organophosphorus flame retardant and preparation method and application thereof 威海海润新材料科技有限公司 2023-04-25 CN disclosed
CN-115895065-A Anti-aging trans-rubber composition and preparation method thereof 青岛科技大学 2023-04-04 CN disclosed
CN-114628808-B Method for stripping coating layer on metal substrate and application thereof 华中科技大学 2022-12-02 CN disclosed
CN-114628808-A Method for stripping coating layer on metal substrate and application thereof 华中科技大学 2022-06-14 CN disclosed
CN-114164521-A Sheath-core structure flame-retardant polyacrylonitrile composite fiber and preparation method and application thereof 天津工业大学 2022-03-11 CN disclosed
US-11203731-B2 Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate FUJIMI INCORPORATED (JP) 2021-12-21 US disclosed
US-20210130735-A1 COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2021-05-06 US disclosed
US-20050204639-A1 Polishing composition and polishing method FUJIMI INCORPORATED (JP) 2005-09-22 US disclosed
US-20050205837-A1 Polishing composition and polishing method FUJIMI INCORPORATED (JP) 2005-09-22 US disclosed