⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25360813 | 0.96 | — | — | |
| SCHEMBL5330534 | 0.75 | — | — | |
| SCHEMBL2178775 | 0.75 | — | — | |
| SCHEMBL5329594 | 0.75 | — | — | |
| SCHEMBL5329590 | 0.75 | — | — | |
| SCHEMBL17924577 | 0.73 | — | — | |
| SCHEMBL24822556 | 0.73 | — | — | |
| Ammonia Solution, Strong SCHEMBL27669 | 0.70 | — | — | |
| SCHEMBL8394072 | 0.64 | — | — | |
| SCHEMBL11804356 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | claimed |
| CN-117258208-A | Fire extinguishing agent suitable for lithium battery fire fighting and preparation method thereof | 中船九江海洋装备(集团)有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-115466601-B | Fluorine-containing electronic cooling liquid | 北京宇极科技发展有限公司 | 2023-03-24 | — | — | CN | claimed |
| CN-115466601-A | Fluorine-containing electronic cooling liquid | 北京宇极科技发展有限公司 | 2022-12-13 | — | — | CN | claimed |
| US-20220310407-A1 | ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | Wonik Materials (KR) | 2022-09-29 | — | — | US | claimed |
| US-10883071-B2 | Cleaning solvent compositions and their use | ZYNON TECHNOLOGIES, LLC (US) | 2021-01-05 | — | — | US | claimed |
| US-20180216047-A1 | CLEANING SOLVENT COMPOSITIONS AND THEIR USE | ZYNON TECHNOLOGIES, LLC | 2018-08-02 | — | — | US | claimed |
| US-6156824-A | Lubricative polymer containing liquid and method of forming film of lubricative polymer | NIPPON ZEON CO., LTD. (JP) | 2000-12-05 | — | — | US | claimed |
| EP-0889092-A1 | LUBRICATIVE POLYMER CONTAINING LIQUID AND METHOD OF FORMING FILM OF LUBRICATIVE POLYMER | NIPPON ZEON CO., LTD. (JP) | 1999-01-07 | — | — | EP | claimed |
| US-20260098115-A1 | RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, PATTERN, AND ELECTRONIC DEVICE COMPRISING SAME | TOSOH CORPORATION (JP) | 2026-04-09 | — | — | US | disclosed |
| EP-4317225-B1 | FLUORINE RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, AND ELECTRONIC DEVICE PROVIDED THEREWITH | TOSOH CORP (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4596592-A1 | RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, PATTERN, AND ELECTRONIC DEVICE COMPRISING SAME | Tosoh Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| CN-119948073-A | Resin, composition, photocrosslinked product, pattern and electronic device provided with same | 东曹株式会社 | 2025-05-06 | — | — | CN | disclosed |
| WO-1999006616-A1 | FLASH-SPINNING PROCESS AND FLASH-SPINNING SOLUTION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-02-11 | — | — | WO | disclosed |
| EP-0889092-A1 | LUBRICATIVE POLYMER CONTAINING LIQUID AND METHOD OF FORMING FILM OF LUBRICATIVE POLYMER | NIPPON ZEON CO., LTD. (JP) | 1999-01-07 | — | — | EP | disclosed |
| US-5852125-A | Fluororubber, a process for its production and its use, as well as a process for producing fluororubber moldings and/or coatings | BAYER AKTIENGESELLSCHAFT (DE) | 1998-12-22 | — | — | US | disclosed |
| US-5648566-A | Methyleneperfluorocycloalkanes and their use in the production of thermoplastic fluororesins | BAYER AKTIENGESELLSCHAFT (DE) | 1997-07-15 | — | — | US | disclosed |
| US-5399645-A | Allyl substituted vinyl ethers which undergo cyclization polymerization, clear coatings for optical fibers, moldings | BAYER AKTIENGESELLSCHAFT (DE) | 1995-03-21 | — | — | US | disclosed |
| US-5313003-A | Fluorinated monomers for heat resistant polymers | BAYER AKTIENGESELLSCHAFT (DE) | 1994-05-17 | — | — | US | disclosed |