SCHEMBL6409299

SCHEMBL6409299

CCCCCc1ccc([N+]#N)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 2/20 0.53
▸ ADRA2A P08913 2/20 0.53
▸ ADORA3 P0DMS8 2/20 0.53
▸ TACR2 P21452 2/20 0.53
▸ SLC6A2 P23975 2/20 0.53
▸ SLC6A4 P31645 2/20 0.53
▸ SLC6A3 Q01959 2/20 0.53
▸ HSD17B10 Q99714 2/20 0.53
▸ ALDH1A1 P00352 2/20 0.53
▸ KDM4E B2RXH2 1/20 0.53
▸ LMNA P02545 1/20 0.53
▸ SHBG P04278 1/20 0.53
▸ TP53 P04637 1/20 0.53
▸ CYP3A4 P08684 1/20 0.53
▸ HSPD1 P10809 1/20 0.53
▸ ADRB3 P13945 1/20 0.53
▸ HTR2C P28335 1/20 0.53
▸ HSPE1 P61604 1/20 0.53
▸ HIF1A Q16665 1/20 0.53
▸ TST Q16762 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10820927 0.98 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL6287956 0.98 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL19829487 0.98 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL21539565 0.98 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL114795 0.98 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
Hydrochloric Acid SCHEMBL10935043 0.96 ESR1 (0.55) ESR1ADRA2AADORA3TACR2SLC6A2
Hydrochloric Acid SCHEMBL10821042 0.96 ESR1 (0.55) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL19829017 0.94 HSD17B10 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
Hydrochloric Acid SCHEMBL10820888 0.94 ESR1 (0.53) ESR1ADRA2AADORA3TACR2SLC6A2
Hydrochloric Acid SCHEMBL10820887 0.93 ESR1 (0.52) ESR1ADRA2AADORA3TACR2SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6916590-B2 Resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification ASAHI GLASS COMPANY, LIMITED (JP) 2005-07-12 — — US disclosed
EP-1298491-B1 RESIST COMPOSITION ASAHI GLASS CO LTD (JP) 2005-02-09 — — EP disclosed
US-6733952-B2 A FLUORO-COPOLYMER COMPRISING A FLUOROVINYL ETHER MONOMER AND AN ALICYCLIC ETHYLENIC MONOMER, AND AN ACID-GENERATING ONIUM SALT UPON IRRADIATION WITH LIGHT; TRANSPARENCY, DRY ETCHING, PHOTOSENSITIVITY, RESOLUTION, UNIFORMITY, HEAT RESISTANCE ASAHI GLASS COMPANY, LIMITED (JP) 2004-05-11 — — US disclosed
US-20030148213-A1 Resist composition ASAHI GLASS COMPANY LIMITED (JP) 2003-08-07 — — US disclosed
US-20030130409-A1 A fluoro-copolymer comprising a fluorovinyl ether monomer and an alicyclic ethylenic monomer, and an acid-generating onium salt upon irradiation with light; transparency, dry etching, photosensitivity, resolution, uniformity, heat resistance ASAHI GLASS COMPANY LIMITED (JP) 2003-07-10 — — US disclosed
EP-1302813-A1 RESIST COMPOSITION Asahi Glass Company, Limited (JP) 2003-04-16 — — EP disclosed
EP-1298491-A1 RESIST COMPOSITION ASAHI GLASS COMPANY LTD. (JP) 2003-04-02 — — EP disclosed
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