SCHEMBL64167

SCHEMBL64167

OCC(O)CN1CCCCC1

nearest known ligand 0.95

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 2/20 0.95
MAPT P10636 1/20 0.95
MEN1 O00255 2/20 0.76
KMT2A Q03164 2/20 0.76
HSD17B10 Q99714 2/20 0.55
CYP2D6 P10635 2/20 0.48
ADRA2A P08913 1/20 0.48
ADRA2B P18089 1/20 0.48
ADRA2C P18825 1/20 0.48
CYP2C19 P33261 1/20 0.48
POLB P06746 2/20 0.46
TSHR P16473 2/20 0.46
HIF1A Q16665 1/20 0.46
KDM4E B2RXH2 3/20 0.44
USP2 O75604 1/20 0.44
ACE2 Q9BYF1 1/20 0.44
ALDH1A1 P00352 1/20 0.44
HTT P42858 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
ANPEP P15144 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5218128 1.00 ATM (0.95) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL7572154 1.00 ATM (0.95) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL4376160 1.00 ATM (0.95) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL4378012 1.00 ATM (0.95) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL4381896 0.97 ATM (1.00) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL10477 0.97 ATM (1.00) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL4382059 0.97 ATM (1.00) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL3966681 0.95 ATM (0.86) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL3971687 0.95 ATM (0.95) ATMMAPTMEN1KMT2AHSD17B10
SCHEMBL7571918 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2113 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4720199-A1 SELF-CROSSLINKABLE URETHANE (METH)ACRYLATES ARKEMA France (FR) 2026-04-08 EP claimed
EP-4607278-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT Ycchem Co., Ltd. (KR) 2025-08-27 EP claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 US claimed
CN-119998727-A Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance YC化学制品株式会社 2025-05-13 CN claimed
WO-2024245621-A1 SELF-CROSSLINKABLE URETHANE (METH)ACRYLATES ARKEMA FRANCE (FR) 2024-12-05 WO claimed
US-20240342649-A1 SEAWATER ELECTROLYSIS ENABLES SCALABLE ATMOSPHERIC CO2 MINERALIZATION UNITED STATES DEPARTMENT OFENERGY 2024-10-17 US claimed
CN-115677994-B Preparation and application of polyester and nano silver conductive film based on biphenyl dicarboxylic acid 武汉科技大学 2024-09-17 CN claimed
US-12042765-B2 Electrochemically enhanced process for next generation carbon dioxide capture THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2024-07-23 US claimed
EP-4363084-A1 SEAWATER ELECTROLYSIS ENABLES SCALABLE ATMOSPHERIC COMINERALIZATION The Regents of the University of California (US) 2024-05-08 EP claimed
WO-2024085293-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT 영창케미칼 주식회사 2024-04-25 WO claimed
EP-0743574-A2 Migration imaging members XEROX CORPORATION (US) 1996-11-20 EP claimed
US-5563014-A SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT XEROX CORPORATION (US) 1996-10-08 US claimed
US-5514505-A SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE XEROX CORPORATION (US) 1996-05-07 US claimed
EP-0673782-A2 Recording sheets containing pyrrole, pyrrolidine, pyridine, piperidine, homopiperidine, quinoline, isoquinoline, quinuclidine, indole, and indazole compounds XEROX CORPORATION (US) 1995-09-27 EP claimed
EP-0670053-A1 SOLID ANTIFOGGANT AGENT AND SOLID SINGLE PART HIGH CONTRAST RAPID ACCESS DEVELOPER SUN CHEMICAL CORPORATION (US) 1995-09-06 EP claimed
WO-1994011783-A1 SOLID ANTIFOGGANT AGENT AND SOLID SINGLE PART HIGH CONTRAST RAPID ACCESS DEVELOPER SUN CHEMICAL CORPORATION (US) 1994-05-26 WO claimed
US-5272045-A Water soluble antifoggant for powder developer solutions SUN CHEMICAL CORPORATION (US) 1993-12-21 US claimed
EP-0267264-B1 HIGH CONTRAST DEVELOPMENT OF PHOTOGRAPHIC ELEMENTS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1990-07-25 EP claimed
EP-0267264-A1 HIGH CONTRAST DEVELOPMENT OF PHOTOGRAPHIC ELEMENTS. EASTMAN KODAK CO (US) 1988-05-18 EP claimed
WO-1987007039-A2 HIGH CONTRAST DEVELOPMENT OF PHOTOGRAPHIC ELEMENTS EASTMAN KODAK COMPANY (US) 1987-11-19 WO claimed