SCHEMBL6429658

SCHEMBL6429658

C=COC(=O)C(C)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1401838 0.79
SCHEMBL19105201 0.79 TSHR (0.39)
SCHEMBL93534 0.79
SCHEMBL777516 0.79 TSHR (0.44)
SCHEMBL148791 0.77
SCHEMBL4201386 0.77
SCHEMBL2911301 0.77
Ethylene SCHEMBL624961 0.77 TSHR (0.38)
SCHEMBL12907664 0.77
SCHEMBL480449 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112955261-A Method for forming multilayer coating film 日涂汽车涂料有限公司 2021-06-11 CN disclosed
CN-110582203-A Antimicrobial nonwoven wet wipe in combination with nonionic binders 瓦克化学股份公司 2019-12-17 CN disclosed
CN-110518293-A A kind of preparation method of solid lithium ion battery TIANJIN LISHEN BATTERY JOINT STOCK CO LTD 2019-11-29 CN disclosed
CN-105359301-B Positive electrode for nonaqueous electrolyte secondary battery and non-aqueous electrolyte secondary battery 麦克赛尔控股株式会社 2018-11-30 CN disclosed
CN-104685693-B electrolyte, electrochemical device, lithium battery and module 大金工业株式会社 2018-08-31 CN disclosed
CN-104272521-B Non-aqueous secondary batteries and non-aqueous secondary batteries electrolyte 富士胶片株式会社 2017-08-18 CN disclosed
CN-101563800-B Electrode active material for non-aqueous secondary battery MATSUSHITA ELECTRIC INDUSTRIAL CO.,LTD. (JP) 2012-02-01 CN disclosed
CN-101563800-A Electrode active material for non-aqueous secondary battery PANASONIC CORP (JP) 2009-10-21 CN disclosed
US-6939651-B2 Electrophotographic photoconductor, and process cartridge and electrophotographic apparatus using the same RICOH COMPANY, LTD. (JP) 2005-09-06 US disclosed
US-20030059695-A1 Electrophotographic photoconductor, and process cartridge and electrophotographic apparatus using the same RICOH COMPANY, LTD. (JP) 2003-03-27 US disclosed
EP-0608131-B1 Resin composition and antifouling paint HITACHI CHEMICAL CO LTD (JP) 1998-06-17 EP disclosed
US-5439512-A Contains a triazole, thiadiazole or benzotriazole derivative HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-08-08 US disclosed
EP-0608131-A1 Resin composition and antifouling paint HITACHI CHEMICAL CO., LTD. (JP) 1994-07-27 EP disclosed