SCHEMBL6429936

SCHEMBL6429936

NC12CCCCC1CCCC2

nearest known ligand 0.46

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.35
MAPT P10636 1/20 0.35
LMNA P02545 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18306055 1.00 KDM4E (0.35) KDM4EMAPTLMNATSHR
SCHEMBL2126830 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL20610083 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL20198577 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL2125868 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL23740127 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL8777072 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL20104757 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL2127065 0.97 KDM4E (0.34) KDM4EMAPT
SCHEMBL7383849 0.97 KDM4E (0.34) KDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3591387-B1 METHOD FOR IDENTIFYING MOLECULAR STRUCTURE UNIV TOKYO (JP) 2023-09-27 EP disclosed
EP-3169671-A1 SUBSTITUTED UREA DERIVATIVES AND PHARMACEUTICAL USES THEREOF Sunshine Lake Pharma Co., Ltd. (CN) 2017-05-24 EP disclosed
WO-2016008433-A1 SUBSTITUTED UREA DERIVATIVES AND PHARMACEUTICAL USES THEREOF SUNSHINE LAKE PHARMA CO., LTD. (CN) 2016-01-21 WO disclosed
WO-2015043492-A1 SUBSTITUTED UREA DERIVATIVES AND USES THEREOF IN MEDICINE SUNSHINE LAKE PHARMA CO., LTD. (CN) 2015-04-02 WO disclosed
EP-0990634-B1 ACYLATING AGENTS, ACYLATION METHOD WITH THE USE OF THE SAME AND ADAMANTANE DERIVATIVES DAICEL CHEM (JP) 2013-04-10 EP disclosed
US-6899980-B2 Photomask material and process of producing photomask from the photomask material FUJI PHOTO FILM CO., LTD. (JP) 2005-05-31 US disclosed
US-20030091908-A1 Photomask material and process of producing photomask from the photomask material FUJI PHOTO FILM CO., LTD. (JP) 2003-05-15 US disclosed
US-6429314-B1 USING 1,2-DICARBONYL DERIVATIVE OR ITS HYDROXY REDUCTIVE, OXYGEN, COBALT ACETATE METAL COMPOUND, AND N-HYDROXYPHTHALIMIDE OR OTHER IMIDE DERIVATIVE DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-08-06 US disclosed
EP-0990634-A1 ACYLATING AGENTS, ACYLATION METHOD WITH THE USE OF THE SAME AND ADAMANTANE DERIVATIVES Daicel Chemical Industries, Ltd. (JP) 2000-04-05 EP disclosed
US-5124234-A Protective coating for printed circuits FUJI PHOTO FILM CO., LTD. (JP) 1992-06-23 US disclosed
US-4948700-A PHOTOPOLYMERIZABLE COMPOSITION OF EPOXY NOVOLAKS, UNSATURATED ACIS, POLYBASIC ANHYDRIDES, UNSATURATED ETHYLENIC COMPOUNDS, EPOXY COMPONENTS; CURING, MASHING, PRINTED CIRCUITS FUJI PHOTO FILM CO., LTD. (JP) 1990-08-14 US disclosed
US-4816549-A FATTYAMINE CHAIN STOPPER UNION CAMP CORPORATION (US) 1989-03-28 US disclosed
EP-0132542-B1 HYDROHALOGENATION OF CONJUGATED DIENES IN THE PRESENCE OF ORGANIC AMINES Union Camp Corporation (US) 1986-10-08 EP disclosed
EP-0132545-A2 Isomerization of allylic halides with organic amines Union Camp Corporation (US) 1985-02-13 EP disclosed
EP-0132542-A1 Hydrohalogenation of conjugated dienes in the presence of organic amines Union Camp Corporation (US) 1985-02-13 EP disclosed