SCHEMBL6435205

SCHEMBL6435205

CCCCCCCC([O])CCC

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.48
PPARD Q03181 1/20 0.48
ZDHHC20 Q5W0Z9 1/20 0.48
ZDHHC2 Q9UIJ5 1/20 0.48
GPR84 Q9NQS5 4/20 0.44
FDPS P14324 3/20 0.44
TSHR P16473 1/20 0.44
THRB P10828 1/20 0.44
FFAR1 O14842 1/20 0.44
LMNA P02545 1/20 0.44
DNM1 Q05193 2/20 0.43
ZDHHC7 Q9NXF8 1/20 0.43
MAPT P10636 1/20 0.43
OPRM1 P35372 1/20 0.42
ADH1B P00325 1/20 0.41
ADH1C P00326 1/20 0.41
ADH1A P07327 1/20 0.41
ADH4 P08319 1/20 0.41
ADH7 P40394 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL76976 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL6433035 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL27772339 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL77284 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL79484 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL11337707 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL1879989 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL9177399 1.00 LCK (0.48) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL1678302 0.97 LCK (0.44) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL8862993 0.94 LCK (0.52) LCKPPARDZDHHC20ZDHHC2GPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1172400-B1 THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY YUPO CORP (JP) 2005-12-28 EP disclosed
US-6586106-B2 Ink transfer, adhesion and aging stability, and being satisfactory in back ghost when offset printing using oxidation polymerization type ink is performed on both faces YUPO CORPORATION (JP) 2003-07-01 US disclosed
US-20020054991-A1 Thermoplastic resin film satisfactory in printability YUPO CORPORATION (JP) 2002-05-09 US disclosed
EP-1172400-A1 THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY Yupo Corporation (JP) 2002-01-16 EP disclosed
EP-0395446-A2 N-acryloylpiperazine derivatives, their preparation and their use as paf antagonists Sankyo Company Limited (JP) 1990-10-31 EP disclosed
US-4683244-A Sebosuppressive cosmetic preparations containing alkoxy or alkylbenzyloxy benzoic acids or their salts HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 1987-07-28 US disclosed
US-4503244-A Sebosuppressive topical cosmetic preparations containing alkoxybenzoic acid esters, process for inhibiting sebum production and alkoxybenzoic acid esters HENKEL KOMMANDITGESELLSCHAFT (DE) 1985-03-05 US disclosed
EP-0114051-A1 Use of sebosuppressive cosmetic products containing alkoxybenzoic esters Henkel Kommanditgesellschaft auf Aktien (DE) 1984-07-25 EP disclosed