⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17163520 | 0.75 | — | — | |
| SCHEMBL1330354 | 0.67 | — | — | |
| SCHEMBL31241145 | 0.55 | — | — | |
| SCHEMBL1330128 | 0.55 | — | — | |
| SCHEMBL317865 | 0.55 | — | — | |
| SCHEMBL467802 | 0.55 | — | — | |
| Bicarbonate SCHEMBL1160878 | 0.55 | — | — | |
| Bicarbonate SCHEMBL15271537 | 0.52 | — | — | |
| Bicarbonate SCHEMBL1179 | 0.52 | — | — | |
| Bicarbonate SCHEMBL11066368 | 0.52 | CA1 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | claimed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | claimed |
| US-20020172766-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-11-21 | — | — | US | claimed |
| US-20050038276-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | LAXMAN RAVI K (US) | 2005-02-17 | — | — | US | disclosed |
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | disclosed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | disclosed |
| US-20020172766-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-11-21 | — | — | US | disclosed |