⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1578894 | 0.72 | — | — | |
| SCHEMBL6414382 | 0.70 | — | — | |
| SCHEMBL14097516 | 0.67 | — | — | |
| SCHEMBL6407746 | 0.67 | — | — | |
| SCHEMBL1578731 | 0.67 | — | — | |
| SCHEMBL60584 | 0.67 | — | — | |
| SCHEMBL3209586 | 0.64 | — | — | |
| SCHEMBL322634 | 0.64 | — | — | |
| SCHEMBL6443148 | 0.64 | — | — | |
| SCHEMBL16792522 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-2120336-A | — | — | None | — | — | JP | disclosed |
| US-9296947-B2 | Plasma etching gas and plasma etching method | ZEON CORPORATION (JP) | 2016-03-29 | — | — | US | disclosed |
| US-20140306146-A1 | PLASMA ETCHING GAS AND PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2014-10-16 | — | — | US | disclosed |
| EP-1203760-B1 | Method for producing cyclopropanecarboxylates | SUMITOMO CHEMICAL CO (JP) | 2005-04-13 | — | — | EP | disclosed |
| US-6706910-B2 | BY TRANSESTERIFICATION OF A CYCLOPROPANECARBOXYLATE AND A MONOHYDROXY COMPOUND IN THE PRESENCE OF A LITHIUM ALKOXIDE OR LITHIUM ARYLOXIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-03-16 | — | — | US | disclosed |
| EP-1203760-A1 | Method for producing cyclopropanecarboxylates | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-08 | — | — | EP | disclosed |
| US-20020052525-A1 | Method for producing cyclopropanecarboxylates | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-02 | — | — | US | disclosed |
| JP-H02120336-A | PRODUCTION OF FOAMED SYNTHETIC RESIN | ASAHI GLASS CO LTD | 1990-05-08 | — | — | JP | disclosed |