⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL285341 | 0.75 | TSHR (0.32) | — | |
| SCHEMBL4269155 | 0.74 | — | — | |
| SCHEMBL1226913 | 0.73 | — | — | |
| SCHEMBL646646 | 0.73 | TSHR (0.30) | — | |
| SCHEMBL427237 | 0.73 | TSHR (0.30) | — | |
| SCHEMBL11251671 | 0.71 | TSHR (0.35) | — | |
| SCHEMBL976733 | 0.71 | — | — | |
| SCHEMBL153116 | 0.71 | — | — | |
| SCHEMBL3622665 | 0.71 | — | — | |
| SCHEMBL432141 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 141 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8216649-B2 | Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device | JSR CORPORATION (JP) | 2012-07-10 | — | — | US | claimed |
| EP-3239111-B1 | CURABLE COMPOSITION, TRANSFER FILM, FRONT PLATE OF IMAGE DISPLAY DEVICE, FRONT PLATE-INTEGRATED SENSOR, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD FOR FRONT PLATE OF IMAGE DISPLAY DEVICE | FUJIFILM CORP (JP) | 2021-02-17 | — | — | EP | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-3239111-A1 | CURABLE COMPOSITION, TRANSFER FILM, FRONT PLATE OF IMAGE DISPLAY DEVICE, FRONT PLATE-INTEGRATED SENSOR, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD FOR FRONT PLATE OF IMAGE DISPLAY DEVICE | FUJIFILM Corporation (JP) | 2017-11-01 | — | — | EP | disclosed |
| US-9268451-B2 | Transfer film, manufacturing method of capacitive input device, capacitive input device, and image display device including the same | FUJIFILM CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| EP-2182405-B1 | LIQUID CRYSTAL ALIGNING AGENT, METHOD FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | JSR CORP (JP) | 2016-01-13 | — | — | EP | disclosed |
| US-9050624-B2 | Film-forming composition for imprinting, method of manufacturing a structure, and structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150092123-A1 | TRANSFER FILM, MANUFACTURING METHOD OF CAPACITIVE INPUT DEVICE, CAPACITIVE INPUT DEVICE, AND IMAGE DISPLAY DEVICE INCLUDING THE SAME | FUJIFILM CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |