Sulfuric Acid

Sulfuric Acid

SCHEMBL6473148

C=C(C)C(=O)OCCC[N+](C)(C)C.C=C(C)C(=O)OCCC[N+](C)(C)C.O=S(=O)([O-])[O-]

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
THRB P10828 1/20 0.43
CHRM5 P08912 4/20 0.43
CHRM1 P11229 4/20 0.43
CHRM3 P20309 4/20 0.43
CHRM2 P08172 3/20 0.40
CHRM4 P08173 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
HTR1A P08908 2/20 0.40
CHRNB2 P17787 2/20 0.40
CHRNA7 P36544 2/20 0.40
CHRNA4 P43681 2/20 0.40
BBOX1 O75936 1/20 0.40
PGR P06401 1/20 0.40
TBXA2R P21731 1/20 0.40
CHRNB4 P30926 1/20 0.40
CHRNA3 P32297 1/20 0.40
CHRNA10 Q9GZZ6 1/20 0.40
CHRNA9 Q9UGM1 1/20 0.40
GALR3 O60755 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7033766 0.92 TSHR (0.46) TSHRTHRBCHRM5CHRM1CHRM3
Hydrochloric Acid SCHEMBL352728 0.91 TSHR (0.58) TSHRTHRBCHRM5CHRM1CHRM3
SCHEMBL202124 0.91 TSHR (0.58) TSHRTHRBCHRM5CHRM1CHRM3
SCHEMBL28589432 0.90 TSHR (0.51) TSHRTHRBCHRM5CHRM1CHRM3
Sulfuric Acid SCHEMBL662900 0.90 CHRM5 (0.55) TSHRTHRBCHRM5CHRM1CHRM3
Sulfuric Acid SCHEMBL9223976 0.90 CHRM5 (0.55) TSHRTHRBCHRM5CHRM1CHRM3
Bromide SCHEMBL1255402 0.90 TSHR (0.56) TSHRTHRBCHRM5CHRM1CHRM3
SCHEMBL28077637 0.90 TSHR (0.56) TSHRTHRBCHRM5CHRM1CHRM3
Iodide SCHEMBL1254986 0.90 TSHR (0.56) TSHRTHRBCHRM5CHRM1CHRM3
Fluoride Ion SCHEMBL1255065 0.90 TSHR (0.56) TSHRTHRBCHRM5CHRM1CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104804897-A Composition for household care containing a cationic nanogel RHODIA OPERATIONS 2015-07-29 CN claimed
CN-100335029-C Aerosol device containing a condensation polymer comprising at least polyurethane and/or polyurea unit LAYA CO LTD (FR) 2007-09-05 CN claimed
CN-1292675-A Aerosol device containing a condensation polymer comprising at least polyurethane and/or polyurea unit OREAL (FR) 2001-04-25 CN claimed
CN-105745300-B Method of consolidating solid materials during subterranean treatment operations 韦特福特科技控股有限责任公司 2019-10-22 CN disclosed
CN-110325169-A cleaning composition 欧莱雅 2019-10-11 CN disclosed
CN-110087627-A Composition comprising at least two anionic surfactants, nonionic surfactant and amphoteric surfactant and at least one dandruff removing agent 莱雅公司 2019-08-02 CN disclosed
CN-110035738-A Flexible solid cosmetic composition and cosmetic treatment method comprising sulfonic acid analog anion surfactants, fatty ester and fatty alcohol 莱雅公司 2019-07-19 CN disclosed
CN-109908028-A Cosmetic composition, colouring method and device 莱雅公司 2019-06-21 CN disclosed
CN-109790684-A Method for manufacturing paper, cardboard or the like 凯米罗总公司 2019-05-21 CN disclosed
CN-109152712-A Cosmetic composition and cosmetic treatment method comprising anionic surfactant, amphoteric surfactant, cationic polymer and the liquid fatty substance selected from fatty alcohol and fatty ester 莱雅公司 2019-01-04 CN disclosed
CN-108472509-A Include the hair dressing composition and hairdressing processing method of silicone and surfactant 欧莱雅 2018-08-31 CN disclosed
CN-105745300-A Method to consolidate solid materials during subterranean treatment operations 路博润油田解决方案公司 2016-07-06 CN disclosed
CN-103442567-B Containing the composition of polymerization plasma type compound comprising imidazole group BASF SE (DE) 2016-02-10 CN disclosed
CN-104804897-A Composition for household care containing a cationic nanogel RHODIA OPERATIONS 2015-07-29 CN disclosed
CN-104739669-A COMPOSITION COMPRISING AT LEAST ONE FATTY SUBSTANCE AND AT LEAST ONE CATIONIC POLYMER, DYEING OR LIGHTENING PROCESS USING IT AND DEVICES THEREFOR OREAL 2015-07-01 CN disclosed
CN-104350023-A Method for the production of solid accelerators for construction material mixtures CONSTR RES & TECH GMBH 2015-02-11 CN disclosed
WO-2005075531-A1 AMPHIPHILIC BLOCK AND GRAFT COPOLYMERS CONTAINING HEAVY ELEMENTS, METHOD FOR THE PRODUCTION THEREOF, AND USE OF THE SAME AS X-RAY CONTRAST AGENTS FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2005-08-18 WO disclosed
CN-1337976-A Synthetic polymers having hydrogen bonding capability and containing polysiloxane units KIMBERLY CLARK CO (US) 2002-02-27 CN disclosed
CN-1203526-A Personal cleansing composition COLGATE PALMOLIVE CO (US) 1998-12-30 CN disclosed
US-5112903-A ARTICLES MOLDED FROM MOISTURE SHRINKABLE RESINS SANYO CHEMICAL INDUSTRIES, LTD. (JP) 1992-05-12 US disclosed