⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL121695 | 0.94 | — | — | |
| SCHEMBL1560310 | 0.94 | CA1 (0.86) | — | |
| Methane SCHEMBL9054832 | 0.94 | — | — | |
| SCHEMBL5382582 | 0.94 | — | — | |
| SCHEMBL15864274 | 0.88 | CA1 (0.75) | — | |
| SCHEMBL4248879 | 0.88 | — | — | |
| SCHEMBL3243495 | 0.88 | CA1 (0.75) | — | |
| SCHEMBL16703451 | 0.88 | — | — | |
| SCHEMBL15864347 | 0.88 | CA1 (0.75) | — | |
| SCHEMBL15864291 | 0.88 | CA1 (0.75) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 257 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240192591-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-12001139-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| US-20240176235-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-20240176238-A1 | SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-11994799-B2 | Negative resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-28 | — | — | US | disclosed |
| US-20240160101-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| US-20240118615-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240118610-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240111212-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-04 | — | — | US | disclosed |
| US-20240103367-A1 | Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-28 | — | — | US | disclosed |
| US-7879530-B2 | Antireflective coating composition, antireflective coating, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-01 | — | — | US | disclosed |
| US-20100178617-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100151381-A1 | ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING , AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090087799-A1 | ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-7510820-B2 | Resist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-31 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20070122740-A1 | Resist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-6706826-B1 | COMONOMERS COMPRISING ALICYCLIC AND LACTONE STRUCTURES; HYDROPHOBIC AND HEAT RESISTANCE, SOLVENT SOLUBILITY; PAINTS | MITSUBISHI RAYON CO., LTD. (JP) | 2004-03-16 | — | — | US | disclosed |
| EP-1074566-A1 | COPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION | Mitsubishi Rayon Co., Ltd. (JP) | 2001-02-07 | — | — | EP | disclosed |