⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12657638 | 1.00 | — | — | |
| SCHEMBL12806444 | 1.00 | — | — | |
| SCHEMBL7538997 | 1.00 | — | — | |
| SCHEMBL1783097 | 0.85 | ACE2 (0.50) | — | |
| SCHEMBL13410354 | 0.84 | GABRR1 (0.46) | — | |
| SCHEMBL7916216 | 0.83 | — | — | |
| SCHEMBL10037941 | 0.83 | — | — | |
| SCHEMBL7546267 | 0.83 | — | — | |
| SCHEMBL859004 | 0.83 | — | — | |
| SCHEMBL8064226 | 0.81 | CA1 (0.64) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1899 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12509598-B2 | Process solution composition for polymer treatment comprising a fluorine compound, a ketone solvent, and a polar aprotic solvent | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-12-30 | — | — | US | claimed |
| US-12458918-B2 | Process and apparatus for treating methane-containing gas | KANADEVIA INOVA AG (CH) | 2025-11-04 | — | — | US | claimed |
| EP-3720926-B1 | RECOVERY PROCESS FOR HIGH PRESSURE PROCESSING SYSTEM | STEEPER ENERGY APS (DK) | 2025-09-17 | — | — | EP | claimed |
| US-20250262588-A1 | PROCESS AND APPARATUS FOR TREATING METHANE-CONTAINING GAS | KANADEVIA INOVA AG (CH) | 2025-08-21 | — | — | US | claimed |
| WO-2025150071-A1 | A TERNARY INSECTICIDAL COMPOSITION FOR INSECTS, PESTS AND MITES | RAJDHANI PETROCHEMICALS PRIVATE LIMITED (IN) | 2025-07-17 | — | — | WO | claimed |
| WO-2025109628-A1 | A SYNERGISTIC TERNARY INSECTICIDAL COMPOSITION | RAJDHANI PETROCHEMICALS PRIVATE LIMITED (IN) | 2025-05-30 | — | — | WO | claimed |
| EP-4536380-A1 | PROCESS AND APPARATUS FOR TREATING METHANE-CONTAINING GAS | Kanadevia Inova AG (CH) | 2025-04-16 | — | — | EP | claimed |
| CN-116239893-B | Quaternary ammonium salt modified cyanine fluorescent dye and its synthesis and application | 大连理工大学 | 2024-07-09 | — | — | CN | claimed |
| WO-2023237568-A1 | PROCESS AND APPARATUS FOR TREATING METHANE-CONTAINING GAS | HITACHI ZOSEN INOVA AG (CH) | 2023-12-14 | — | — | WO | claimed |
| EP-4289498-A1 | METHOD AND DEVICE FOR THE TREATMENT OF GAS CONTAINING METHANE | Hitachi Zosen Inova AG (CH) | 2023-12-13 | — | — | EP | claimed |
| US-20020061946-A1 | Liquid antiozonants and rubber compositions containing same | ADDIVANT USA, LLC | 2002-05-23 | — | — | US | claimed |
| WO-2001081459-A1 | LIQUID ANTIOZONANTS AND RUBBER COMPOSITIONS CONTAINING SAME | UNIROYAL CHEMICAL COMPANY, INC. (US) | 2001-11-01 | — | — | WO | claimed |
| US-5750309-A | POLYHYDROXYSTYRENE, PHOTOACID GENERATOR, SOLVENT, DISSOLUTION INHIBITOR; FOR FINE PATTERNING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-05-12 | — | — | US | claimed |
| US-5679496-A | CONTAINING SULFONIUM SALT HAVING TERT-BUTOXYCARBONYLMETHOXY GROUP(S) AS ACID LABILE GROUPS; SENSITIVITY, RESOLUTION, ETCH AND HEAT RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-10-21 | — | — | US | claimed |
| US-5629134-A | SOLVENT, ALKALI SOLUBLE RESIN, ACID GENERATOR, PYRIDINE SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-13 | — | — | US | claimed |
| US-5207876-A | Ketone, ether or ester extraction agents | Berg, Lloyd (US) | 1993-05-04 | — | — | US | claimed |
| EP-0064222-B1 | PROCESS FOR FORMING RESIST PATTERNS | KABUSHIKI KAISHA TOSHIBA (JP) | 1986-03-05 | — | — | EP | claimed |
| US-4454222-A | Process for forming resist patterns using mixed ketone developers | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1984-06-12 | — | — | US | claimed |
| EP-0064222-A2 | Process for forming resist patterns | KABUSHIKI KAISHA TOSHIBA (JP) | 1982-11-10 | — | — | EP | claimed |
| US-4317945-A | Process for preparing 2-methyl-2-sec.butyl-1,3-propanediol | RUHRCHEMIE AKTIENGESELLSCHAFT (DE) | 1982-03-02 | — | — | US | claimed |