⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13819837 | 1.00 | — | — | |
| SCHEMBL10299587 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL9784988 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL9759307 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL9759303 | 0.97 | — | — | |
| SCHEMBL11095722 | 0.85 | GABRR1 (0.33) | — | |
| SCHEMBL19733366 | 0.85 | GABRR1 (0.33) | — | |
| SCHEMBL28468618 | 0.83 | — | — | |
| SCHEMBL48612 | 0.82 | — | — | |
| SCHEMBL16978757 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3164 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026090241-A1 | NON-TRIAZINE BASED SCAVENGERS | CHAMPIONX LLC (US) | 2026-04-30 | — | — | WO | claimed |
| US-12613468-B2 | Method for forming patterned photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-04-28 | — | — | US | claimed |
| US-12550901-B2 | Compositions containing glufosinate and a synthetic auxin herbicide | CORTEVA AGRISCIENCE LLC (US) | 2026-02-17 | — | — | US | claimed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| CN-112447501-B | Method for forming patterned photoresist layer | 台湾积体电路制造股份有限公司 | 2024-07-26 | — | — | CN | claimed |
| CN-118185046-A | Preparation method of self-repairing material based on reinforced and toughened covalent organic framework filler | 安徽工业大学 | 2024-06-14 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| US-20240103375-A1 | METHOD FOR FORMING PATTERNED PHOTORESIST | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-03-28 | — | — | US | claimed |
| US-4904701-A | HYDROLYZING THE ION EXCHANGE PRECURSOR GROUPS OF A FLUOROPOLYMER BY USING AQUEOUS SOLUTION OF A BASIC ORGANIC NITROGEN COMPOUND | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1990-02-27 | — | — | US | claimed |
| US-4876396-A | AT ORTHO POSITION TO HYDROXYL; AMINE CATALYSTS | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1989-10-24 | — | — | US | claimed |
| US-4855513-A | Chlorination of phenolic compounds | RHONE-POULENC CHIMIE (FR) | 1989-08-08 | — | — | US | claimed |
| US-4827047-A | AMINE CATALYST | RHONE-POULENC CHIMIE (FR) | 1989-05-02 | — | — | US | claimed |
| US-4785020-A | TWO STEP AMINATION OF HALOALKYL POLYMERS | THE DOW CHEMICAL COMPANY (US) | 1988-11-15 | — | — | US | claimed |
| EP-0085592-B1 | BOEHMITES AND EXTREMELY PURE PSEUDOBOEHMITES, AND PROCESS FOR THEIR MANUFACTURE | RHONE-POULENC CHIMIE (FR) | 1986-07-02 | — | — | EP | claimed |
| US-4399235-A | HALOGENATION OF MONOVINYLIDENE AROMATIC POLYMER IN PRESENCE OF ORGANIC LIQUID HAVING HIGH DIELECTRIC CONSTANT | THE DOW CHEMICAL COMPANY (US) | 1983-08-16 | — | — | US | claimed |
| EP-0085592-A1 | Boehmites and extremely pure pseudoboehmites, and process for their manufacture | RHONE-POULENC CHIMIE (FR) | 1983-08-10 | — | — | EP | claimed |
| US-4321331-A | High density ion exchange resins from haloalkylated aromatic polymer | THE DOW CHEMICAL COMPANY (US) | 1982-03-23 | — | — | US | claimed |
| US-4169105-A | FROM CYANOACETIC ACID AND AN ALLYLIC HALIDE, ACID ACCEPTOR | SHELL OIL COMPANY (US) | 1979-09-25 | — | — | US | claimed |