⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL765500 | 1.00 | — | — | |
| SCHEMBL10155539 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL6261037 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL38666755 | 0.96 | — | — | |
| SCHEMBL15679696 | 0.79 | — | — | |
| SCHEMBL26607784 | 0.79 | — | — | |
| SCHEMBL12191272 | 0.79 | — | — | |
| SCHEMBL1936664 | 0.79 | — | — | |
| SCHEMBL10075630 | 0.79 | — | — | |
| SCHEMBL3747159 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2345 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| CN-106715448-B | Process for preparing tris (trialkylsilyl) phosphine | SK化学公司 | 2020-03-03 | — | — | CN | claimed |
| EP-3222623-B1 | METHOD FOR PREPARING TRIS(TRIALKYLSILYL)PHOSPHINE | SK CHEMICALS CO LTD (KR) | 2019-08-28 | — | — | EP | claimed |
| EP-2794525-B1 | AROMATIC TRANSFORMATION USING UZM-39 ALUMINOSILICATE ZEOLITE | UOP LLC (US) | 2018-10-10 | — | — | EP | claimed |
| US-10040809-B2 | Method for preparing tris(trialkylsilyl)phosphine | SK CHEMICALS CO., LTD. (KR) | 2018-08-07 | — | — | US | claimed |
| EP-3222623-A1 | METHOD FOR PREPARING TRIS(TRIALKYLSILYL)PHOSPHINE | SK Chemicals Co., Ltd. (KR) | 2017-09-27 | — | — | EP | claimed |
| US-20170226138-A1 | METHOD FOR PREPARING TRIS(TRIALKYLSILYL)PHOSPHINE | SK CHEMICALS CO., LTD. (KR) | 2017-08-10 | — | — | US | claimed |
| US-7135273-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-14 | — | — | US | claimed |
| US-20060127812-A1 | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2006-06-15 | — | — | US | claimed |
| EP-1669804-A2 | Barrier film material and pattern formation method using the same | Matsushita Electric Industries Co., Ltd. (JP) | 2006-06-14 | — | — | EP | claimed |
| CN-1574218-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| US-20040259040-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-23 | — | — | US | claimed |
| US-5731128-A | ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY | NIPPON PAINT CO., LTD. (JP) | 1998-03-24 | — | — | US | claimed |
| EP-0085592-B2 | BOEHMITES AND EXTREMELY PURE PSEUDOBOEHMITES, AND PROCESS FOR THEIR MANUFACTURE | RHONE-POULENC CHIMIE (FR) | 1991-10-02 | — | — | EP | claimed |
| EP-0085592-B1 | BOEHMITES AND EXTREMELY PURE PSEUDOBOEHMITES, AND PROCESS FOR THEIR MANUFACTURE | RHONE-POULENC CHIMIE (FR) | 1986-07-02 | — | — | EP | claimed |
| EP-0039230-B1 | CURABLE COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1985-12-11 | — | — | EP | claimed |
| EP-0085592-A1 | Boehmites and extremely pure pseudoboehmites, and process for their manufacture | RHONE-POULENC CHIMIE (FR) | 1983-08-10 | — | — | EP | claimed |