Methoxymethane

Methoxymethane

SCHEMBL649174

C1=CC2CCC1C2.COC

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1501827 0.88
SCHEMBL3229477 0.88
Ethane SCHEMBL5851586 0.86
SCHEMBL6065835 0.86
SCHEMBL11183068 0.86
SCHEMBL22129636 0.86
SCHEMBL81839 0.86
SCHEMBL36991 0.86
SCHEMBL446304 0.83
SCHEMBL27260190 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8816485-B2 Methods and materials useful for chip stacking, chip and wafer bonding SUMITOMO BAKELITE CO., LTD. (JP) 2014-08-26 US claimed
US-9263416-B2 Methods and materials useful for chip stacking, chip and wafer bonding SUMITOMO BAKELITE CO., LTD. (JP) 2016-02-16 US disclosed
US-20140349446-A1 METHODS AND MATERIALS USEFUL FOR CHIP STACKING, CHIP AND WAFER BONDING PROMERUS, LLC (US) 2014-11-27 US disclosed
US-8816485-B2 Methods and materials useful for chip stacking, chip and wafer bonding SUMITOMO BAKELITE CO., LTD. (JP) 2014-08-26 US disclosed
US-20120175721-A1 Methods And Materials Useful For Chip Stacking, Chip And Wafer Bonding PROMERUS LLC (US) 2012-07-12 US disclosed
US-8120168-B2 Methods and materials useful for chip stacking, chip and wafer bonding PROMERUS LLC (US) 2012-02-21 US disclosed
CN-102298265-A Photosensitive compositions based on polycyclic polymers 2011-12-28 CN disclosed
EP-1997138-B1 METHODS AND MATERIALS USEFUL FOR CHIP STACKING, CHIP AND WAFER BONDING PROMERUS LLC (US) 2011-09-14 EP disclosed
US-7932161-B2 Methods and materials useful for chip stacking, chip and wafer bonding PROMERUS LLC (US) 2011-04-26 US disclosed
US-7915467-B2 layer contains a cyclic olefin resin having an epoxy group and a photoacid generator; low stress properties and adhesion; prevent breakage of the semiconductor wafer in a process for grinding the backside to make them thinner SUMITOMO BAKELITE COMPANY, LTD. (JP) 2011-03-29 US disclosed
US-20080073741-A1 provide strong bonds while also being readily removed with little or no residues; reworkable; semiconductor; norbornene-type polymer derived from phenethyl norbornene, or glycidyl methyl ether norbornene or decyl norbornene PROMERUS LLC (US) 2008-03-27 US disclosed
US-20070232026-A1 Methods and materials useful for chip stacking, chip and wafer bonding PROMERUS LLC (US) 2007-10-04 US disclosed
WO-2007109326-A2 METHODS AND MATERIALS USEFUL FOR CHIP STACKING, CHIP AND WAFER BONDING PROMERUS LLC (US) 2007-09-27 WO disclosed
CN-101044185-A Photosensitive compositions based on polycyclic polymers PROMERUS LLC (US) 2007-09-26 CN disclosed
EP-1804291-A1 SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-07-04 EP disclosed
EP-1801872-A1 SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-06-27 EP disclosed
EP-1771491-A1 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS Promerus, LLC (US) 2007-04-11 EP disclosed
WO-2006016925-A1 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS PROMERUS LLC (US) 2006-02-16 WO disclosed
US-20060020068-A1 Photosensitive compositions based on polycyclic polymers for low stress, high temperature films PROMERUS, LLC 2006-01-26 US disclosed
CN-1666150-A Photosensitive composition based on polycyclic polymer SUMITOMO BAKELITE CO (JP) 2005-09-07 CN disclosed