SCHEMBL649238

SCHEMBL649238

O=C(O)CCCC(=O)Nc1ncc(/C=C2\S/C(=N\c3ccccc3)NC2=O)s1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.48
RAB9A P51151 3/20 0.48
POLB P06746 3/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
TDP1 Q9NUW8 1/20 0.48
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
MAPT P10636 3/20 0.46
GSK3B P49841 3/20 0.46
DYRK1A Q13627 5/20 0.42
PIM1 P11309 4/20 0.42
CSNK2A1 P68400 4/20 0.42
PIM3 Q86V86 4/20 0.42
DAPK3 O43293 3/20 0.42
DYRK3 O43781 3/20 0.42
MAP4K4 O95819 3/20 0.42
HIPK2 Q9H2X6 3/20 0.42
CLK4 Q9HAZ1 3/20 0.42
MKNK2 Q9HBH9 3/20 0.42
CSNK1G1 Q9HCP0 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL648656 1.00 NPC1 (0.48) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL653261 0.94 NPC1 (0.50) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL653260 0.94 NPC1 (0.50) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL649726 0.87 SYK (0.48) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL650807 0.87 SYK (0.48) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL649045 0.86 MEN1 (0.46) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL649044 0.86 MEN1 (0.46) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL651131 0.86 POLB (0.45) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL651137 0.86 POLB (0.45) NPC1RAB9APOLBSMN1; SMN2TDP1
SCHEMBL10176219 0.85 NPC1 (0.48) NPC1RAB9APOLBSMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107629082-B A kind of novel siliceous benzoxazine and preparation method thereof 西南石油大学 2019-11-22 CN claimed
US-7335310-B2 Method of treating wastewater containing hardly decomposable harmful substances IDEMITSU KOSAN CO., LTD. (JP) 2008-02-26 US claimed
US-20060226083-A1 Method of treating wastewater containing hardly decomposable harmful substances IDEMITSU KOSAN CO., LTD. (JP) 2006-10-12 US claimed
EP-1591422-A1 METHOD OF TREATING WASTEWATER CONTAINING HARDLY DECOMPOSABLE HARMFUL SUBSTANCES IDEMITSU KOSAN CO., LTD. (JP) 2005-11-02 EP claimed
WO-2020196007-A1 RESIN MODIFIER 三洋化成工業株式会社 2020-10-01 WO disclosed
CN-107629082-B A kind of novel siliceous benzoxazine and preparation method thereof 西南石油大学 2019-11-22 CN disclosed
CN-107629082-B A kind of novel siliceous benzoxazine and preparation method thereof 西南石油大学 2019-11-22 CN disclosed
EP-2006086-B1 PROCESS FOR PRODUCTION OF SOFT MAGNETIC METAL STRIP LAMINATE HITACHI METALS LTD (JP) 2019-07-31 EP disclosed
US-10175577-B2 Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component HITACHI CHEMICAL COMPANY, LTD. (JP) 2019-01-08 US disclosed
CN-107629082-A A kind of novel siliceous benzoxazine and preparation method thereof 西南石油大学 2018-01-26 CN disclosed
CN-107629082-A A kind of novel siliceous benzoxazine and preparation method thereof 西南石油大学 2018-01-26 CN disclosed
US-9469761-B2 Liquid crystal polyester-containing liquid composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-18 US disclosed
US-5332648-A Alklali soluble phenolic polymer, cyclic ester or sulfonate which converts to the acid, an onium salt which generates an an acid on exposure to radiation KABUSHIKI KAISHA TOSHIBA (JP) 1994-07-26 US disclosed
US-5206133-A Controlled AGI content FUJI PHOTO FILM CO., LTD. (JP) 1993-04-27 US disclosed
EP-0446947-A2 Gas separating asymmetric membrane UBE INDUSTRIES, LTD. (JP) 1991-09-18 EP disclosed
US-5011768-A Two phase structure of silver chlorobromide crystals, chemically and spectrally sensitized; high speed, latent image storage, antifogging properties FUJI PHOTO FILM CO., LTD. (JP) 1991-04-30 US disclosed
EP-0322861-A2 Silver halide photographic material Fuji Photo Film Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4656227-A FLUORINATED POLYOLEFINS BAYER AKTIENGESELLSCHAFT (DE) 1987-04-07 US disclosed
US-4588835-A Process for preparing alkoxyphenols OTSUKA KAGAKU YAKUHIN KABUSHIKI KAISHA (JP) 1986-05-13 US disclosed
US-4535124-A WHICH CONTAINS A GRAFT POLYMER OF STYRENE, METHYL METHACRYLATE OR STYRENE WITH A RUBBER BAYER AKTIENGESELLSCHAFT (DE) 1985-08-13 US disclosed