⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18118930 | 0.73 | TSHR (0.35) | — | |
| SCHEMBL28512411 | 0.71 | — | — | |
| SCHEMBL10725040 | 0.71 | — | — | |
| SCHEMBL1398272 | 0.69 | — | — | |
| Dimethylformamide SCHEMBL57861 | 0.69 | TSHR (0.60) | — | |
| SCHEMBL2154488 | 0.69 | — | — | |
| SCHEMBL733426 | 0.69 | — | — | |
| SCHEMBL11430371 | 0.67 | — | — | |
| SCHEMBL11423968 | 0.67 | — | — | |
| SCHEMBL4105321 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120302487-A1 | COMPOSITE | REVOLYMER LIMITED (GB) | 2012-11-29 | — | — | US | claimed |
| EP-2494024-A1 | COMPOSITE | Revolymer Limited (GB) | 2012-09-05 | — | — | EP | claimed |
| WO-2011051681-A1 | COMPOSITE | REVOLYMER LIMITED (GB) | 2011-05-05 | — | — | WO | claimed |
| US-20080176943-A1 | One part, solids containing decontamination blend composition | AMERICAN STERILIZER COMPANY | 2008-07-24 | — | — | US | claimed |
| CN-117143853-A | Preparation method of artificial cell model for self-synthesis of uridine monophosphate | 哈尔滨工业大学 | 2023-12-01 | — | — | CN | disclosed |
| CN-114634420-A | Method for continuously preparing methylglycine-N, N-diacetic acid trialkali metal salt | 万华化学集团股份有限公司 | 2022-06-17 | — | — | CN | disclosed |
| US-11061326-B2 | Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-10752783-B2 | Non-stick coating primer compositions and processes for the preparation thereof | SEB S.A. (FR) | 2020-08-25 | — | — | US | disclosed |
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| EP-2393354-B1 | LOW ODOR, HARD SURFACE SPORICIDES AND CHEMICAL DECONTAMINANTS | AMERICAN STERILIZER CO (US) | 2019-08-21 | — | — | EP | disclosed |
| US-20190121233-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-25 | — | — | US | disclosed |
| US-20100196505-A1 | Low odor, hard surface sporicides and chemical decontaminants | AMERICAN STERILIZER COMPANY (US) | 2010-08-05 | — | — | US | disclosed |
| US-20100056613-A1 | SPIROQUINONE COMPOUND AND PHARMACEUTICAL COMPOSITION | HYKES LABORATORIES LLC (JP) | 2010-03-04 | — | — | US | disclosed |
| EP-2070919-A1 | SPIROQUINONE COMPOUND AND PHARMACEUTICAL COMPOSITION | Hykes Laboratories LLC (JP) | 2009-06-17 | — | — | EP | disclosed |
| EP-2059581-A2 | A ONE PART, SOLIDS CONTAINING DECONTAMINATION BLEND COMPOSITION | American Sterilizer Company (US) | 2009-05-20 | — | — | EP | disclosed |
| US-20080176943-A1 | One part, solids containing decontamination blend composition | AMERICAN STERILIZER COMPANY | 2008-07-24 | — | — | US | disclosed |
| WO-2008079170-A2 | A ONE PART, SOLIDS CONTAINING DECONTAMINATION BLEND COMPOSITION | AMERICAN STERILIZER COMPANY (US) | 2008-07-03 | — | — | WO | disclosed |
| US-4833204-A | Epoxy resin composition for a copper-clad laminate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1989-05-23 | — | — | US | disclosed |
| US-4018756-A | ACRYLONITRILE POLYMERS, POLYAMIDES, POLYESTERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-04-19 | — | — | US | disclosed |