⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7453527 | 0.65 | — | — | |
| SCHEMBL6367027 | 0.60 | — | — | |
| SCHEMBL10404 | 0.57 | — | — | |
| SCHEMBL5904396 | 0.57 | — | — | |
| SCHEMBL51336 | 0.57 | — | — | |
| SCHEMBL13343643 | 0.53 | — | — | |
| SCHEMBL4663607 | 0.53 | — | — | |
| SCHEMBL12502051 | 0.53 | — | — | |
| SCHEMBL1829430 | 0.53 | — | — | |
| SCHEMBL726127 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8461181-B2 | Fused heterocyclic compound and use thereof | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 2013-06-11 | — | — | US | disclosed |
| US-8273764-B2 | Fused heterocyclic compounds and use thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-09-25 | — | — | US | disclosed |
| US-20120178779-A1 | FUSED HETEROCYCLIC COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED | 2012-07-12 | — | — | US | disclosed |
| US-20120015975-A1 | FUSED HETEROCYCLIC COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-19 | — | — | US | disclosed |
| US-6949615-B2 | Monomer having electron-withdrawing group and process for preparing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| EP-1331216-A1 | MONOMERS HAVING ELECTRON-WITHDRAWING GROUPS AND PROCESSES FOR PREPARING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030059710-A1 | Monomer having electron-withdrawing group and process for preparing the same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-03-27 | — | — | US | disclosed |