⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29025599 | 1.00 | KMT2A (0.59) | — | |
| SCHEMBL19617353 | 1.00 | — | — | |
| SCHEMBL25299343 | 1.00 | — | — | |
| SCHEMBL862327 | 0.97 | MEN1 (0.64) | — | |
| SCHEMBL16115683 | 0.97 | MEN1 (0.64) | — | |
| Bromide SCHEMBL14778081 | 0.97 | KMT2A (0.56) | — | |
| Hydrochloric Acid SCHEMBL8578344 | 0.97 | KMT2A (0.56) | — | |
| SCHEMBL23163258 | 0.97 | MEN1 (0.64) | — | |
| SCHEMBL915393 | 0.97 | MEN1 (0.64) | — | |
| SCHEMBL14511330 | 0.97 | MEN1 (0.64) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1389 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107083-A2 | SHELF-STABLE LOXSH CATALYST SOLUTION COMPOSITIONS COMPRISING SOLUBLE HIGH HYDRIDE CONCENTRATIONS AND THE PROCESSES FOR PREPARING THEM | ALBEMARLE CORPORATION (US) | 2026-05-21 | — | — | WO | claimed |
| WO-2026104715-A1 | METHOD FOR TREATING AN EFFLUENT STREAM GENERATED BY A CARBON CAPTURE SYSTEM | BASF SE (DE) | 2026-05-21 | — | — | WO | claimed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| US-20250179233-A1 | PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF | ALBEMARLE CORPORATION (US) | 2025-06-05 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| EP-4486808-A2 | PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC COPOLYMERIZATION OF CONJUGATED DIENES AND LIQUID COPOLYMERS THEREOF | ALBEMARLE CORPORATION (US) | 2025-01-08 | — | — | EP | claimed |
| CN-119137172-A | Process and catalyst for hydrogen-mediated anionic copolymerization of conjugated dienes and liquid copolymers thereof | 雅宝公司 | 2024-12-13 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| US-20240034825-A1 | PROCESS AND CATALYSTS FOR HYDROGEN MEDIATED ANIONIC POLYMERIZATION OF CONJUGATED DIENES AND LIQUID POLYMERS THEREOF | ALBEMARLE CORPORATION | 2024-02-01 | — | — | US | claimed |
| US-7135273-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-14 | — | — | US | claimed |
| CN-1835995-A | Polyelectrolyte composition for humidity sensor, polyelectrolyte ink, and method for preparing polyelectrolyte membrane for sensor by inkjet printing | HAEUN CHEMTEC CO LTD (KR) | 2006-09-20 | — | — | CN | claimed |
| US-20060127812-A1 | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2006-06-15 | — | — | US | claimed |
| EP-1669804-A2 | Barrier film material and pattern formation method using the same | Matsushita Electric Industries Co., Ltd. (JP) | 2006-06-14 | — | — | EP | claimed |
| CN-1786820-A | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2006-06-14 | — | — | CN | claimed |
| EP-1506175-A1 | N-SUBSTITUTED TRICYCLIC 3-AMINOPYRAZOLES AS PDGF RECEPTOR INHIBITORS | JANSSEN PHARMACEUTICA N.V. (BE) | 2005-02-16 | — | — | EP | claimed |
| CN-1574218-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| US-20040259040-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-23 | — | — | US | claimed |
| WO-2003097609-A1 | N-SUBSTITUTED TRICYCLIC 3-AMINOPYRAZOLES AS PDFG RECEPTOR INHIBITORS | JANSSEN PHARMACEUTICA N.V. (BE) | 2003-11-27 | — | — | WO | claimed |
| US-6231849-B1 | HUNTING | Schiller, George A. | 2001-05-15 | — | — | US | claimed |