SCHEMBL650461

SCHEMBL650461

C=C(C)C(=O)OCC(C)CCCCCC

nearest known ligand 0.59

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.59
FAAH O00519 5/20 0.46
ACE2 Q9BYF1 1/20 0.46
ZDHHC7 Q9NXF8 1/20 0.41
MAPT P10636 2/20 0.40
THRB P10828 1/20 0.40
CNR1 P21554 1/20 0.39
CNR2 P34972 1/20 0.39
GPR84 Q9NQS5 3/20 0.38
FFAR1 O14842 1/20 0.38
CA1 P00915 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29177463 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL15435922 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL28820003 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL8204683 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL6748216 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL650080 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL6455857 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL31148471 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL652336 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT
SCHEMBL28690513 1.00 TSHR (0.59) TSHRFAAHACE2ZDHHC7MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103119701-B Liquid resin composition and semiconductor device 住友电木株式会社 2016-06-08 CN claimed
CN-103119701-A Liquid resin composition and semiconductor device SUMITOMO BAKELITE CO 2013-05-22 CN claimed
US-20250361408-A1 COATING SYSTEM AND COATED ARTICLE SHERWIN WILLIAMS GUANGDONG NEW MAT CO LTD (CN) 2025-11-27 US disclosed
EP-4646467-A1 TWO-COMPONENT COATING COMPOSITION, AND ARTICLE MADE THEREFROM Valspar Coatings (Shanghai) Co. Ltd. (CN) 2025-11-12 EP disclosed
US-12460104-B2 Two-component waterborne polyurethane coating composition and low gloss coating formed therefrom Sherwin-Williams (Guangdong) New Material Co., Ltd. (CN) 2025-11-04 US disclosed
WO-2025082420-A1 AQUEOUS EMULSION, METHOD FOR PREPARING THE SAME, COATING COMPOSITION AND ARTICLE GUANGDONG HUARUN PAINTS CO., LTD. (CN) 2025-04-24 WO disclosed
WO-2024146484-A1 TWO-COMPONENT COATING COMPOSITION, AND ARTICLE MADE THEREFROM VALSPAR COATINGS (SHANGHAI) CO. LTD. (CN) 2024-07-11 WO disclosed
CN-106842816-B Self-luminous photosensitive resin composition, color filter and image display device 东友精细化工有限公司 2022-03-25 CN disclosed
US-20220064479-A1 TWO-COMPONENT WATERBORNE POLYURETHANE COATING COMPOSITION AND LOW GLOSS COATING FORMED THEREFROM Sherwin-Williams (Guangdong) New Material Co., Ltd. (CN) 2022-03-03 US disclosed
CN-113831456-A Composition comprising a hydroxy acrylic resin and two-component coating composition comprising the same 广东华润涂料有限公司 2021-12-24 CN disclosed
EP-3901229-A1 TWO-COMPONENT AQUEOUS POLYURETHANE COATING COMPOSITION AND LOW-GLOSS COATING FORMED THEREBY Guangdong Huarun Paints Co., Ltd. (CN) 2021-10-27 EP disclosed
CN-1729219-A Process for preparing aqueous dispersions ROEHM GMBH (DE) 2006-02-01 CN disclosed
CN-1726238-A Core and shell particle for modifying impact resistance of a mouldable poly(meth)acrylate material ROEHM GMBH (DE) 2006-01-25 CN disclosed
EP-1167407-B1 VINYL CHLORIDE RESIN, PROCESS FOR PRODUCING THE SAME, AND MOLDED OBJECT SEKISUI CHEMICAL CO LTD (JP) 2005-11-09 EP disclosed
US-20040152821-A1 Polymer composition KANEKA CORPORATION (JP) 2004-08-05 US disclosed
CN-1126766-C Vinyl chloride resin, process for producing the same, and molded object SEKISUI CHEMICAL CO LTD (JP) 2003-11-05 CN disclosed
US-6583221-B1 High impact resistance and a satisfactory surface condition; graft copolymerizing with an acrylic copolymer SEKISUI CHEMICAL CO., LTD. (JP) 2003-06-24 US disclosed
EP-1167407-A1 VINYL CHLORIDE RESIN, PROCESS FOR PRODUCING THE SAME, AND MOLDED OBJECT SEKISUI CHEMICAL CO., LTD. (JP) 2002-01-02 EP disclosed
CN-1323325-A Vinyl chloride resin, process for producing the same, and molded article SEKISUI CHEMICAL CO LTD (JP) 2001-11-21 CN disclosed
US-5520725-A Dental glass ionomer cement composition GC CORPORATION (JP) 1996-05-28 US disclosed