SCHEMBL6505047

SCHEMBL6505047

S=C1OC2CC3CC(C2)CC1C3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20857233 0.70 TSHR (0.32)
SCHEMBL14791314 0.70 TSHR (0.32)
SCHEMBL22733566 0.70 TSHR (0.32)
SCHEMBL15858403 0.70 TSHR (0.32)
SCHEMBL14783023 0.70 TSHR (0.32)
SCHEMBL112482 0.70 TSHR (0.32)
SCHEMBL10285141 0.70 TSHR (0.32)
SCHEMBL15467069 0.70 TSHR (0.32)
SCHEMBL2962447 0.66 TSHR (0.35)
SCHEMBL18815022 0.62 SMN1; SMN2 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1331216-A1 MONOMERS HAVING ELECTRON-WITHDRAWING GROUPS AND PROCESSES FOR PREPARING THE SAME Daicel Chemical Industries, Ltd. (JP) 2003-07-30 EP claimed
US-20030059710-A1 Monomer having electron-withdrawing group and process for preparing the same DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-03-27 US claimed
US-6949615-B2 Monomer having electron-withdrawing group and process for preparing the same DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2005-09-27 US disclosed
EP-1331216-A1 MONOMERS HAVING ELECTRON-WITHDRAWING GROUPS AND PROCESSES FOR PREPARING THE SAME Daicel Chemical Industries, Ltd. (JP) 2003-07-30 EP disclosed
US-20030059710-A1 Monomer having electron-withdrawing group and process for preparing the same DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-03-27 US disclosed