⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL655348 | 0.81 | — | — | |
| SCHEMBL8942362 | 0.80 | — | — | |
| SCHEMBL7760496 | 0.80 | — | — | |
| SCHEMBL5907605 | 0.78 | — | — | |
| SCHEMBL8176892 | 0.78 | — | — | |
| SCHEMBL9060780 | 0.77 | TSHR (0.44) | — | |
| SCHEMBL1317708 | 0.75 | CYP2C19 (0.32) | — | |
| SCHEMBL450657 | 0.71 | — | — | |
| SCHEMBL11240636 | 0.70 | SLC6A4 (0.34) | — | |
| SCHEMBL4331183 | 0.69 | MEN1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115594790-B | Photosensitive polymer containing photoacid generator and preparation method thereof | 苏州威迈芯材半导体有限公司 | 2023-09-19 | — | — | CN | disclosed |
| CN-115594790-A | Photosensitive polymer containing photoacid generator and preparation method thereof | 苏州威迈芯材半导体有限公司（CN） | 2023-01-13 | — | — | CN | disclosed |
| US-20150183912-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-8969483-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8802783-B2 | — | — | 2014-08-12 | — | — | US | disclosed |
| US-8802798-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20130122419-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20120178023-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION | 2012-07-12 | — | — | US | disclosed |
| US-8119751-B2 | — | — | 2012-02-21 | — | — | US | disclosed |
| US-20110196122-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION | 2011-08-11 | — | — | US | disclosed |
| US-20090023878-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2009-01-22 | — | — | US | disclosed |
| US-7432035-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-20070218403-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2007-09-20 | — | — | US | disclosed |
| US-7186495-B2 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2007-03-06 | — | — | US | disclosed |
| US-20010026901-A1 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2001-10-04 | — | — | US | disclosed |