Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | TSHR | P16473 | 5/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | CA3 | P07451 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5614332 | 0.84 | TP53 (0.35) | TDP1CYP3A4ALDH1A1TSHRTP53 | |
| (Phenylsulfinyl)Benzene SCHEMBL43199 | 0.79 | TDP1 (0.37) | TDP1CYP3A4ALDH1A1TSHRCA1 | |
| (Phenylsulfinyl)Benzene SCHEMBL29572063 | 0.76 | TDP1 (0.35) | TDP1CYP3A4ALDH1A1TSHRCA1 | |
| SCHEMBL3834350 | 0.76 | — | — | |
| (Phenylsulfinyl)Benzene SCHEMBL28896702 | 0.76 | TDP1 (0.35) | TDP1CYP3A4ALDH1A1TSHRCA1 | |
| SCHEMBL12336893 | 0.76 | TDP1 (0.35) | TDP1CYP3A4ALDH1A1TSHRCA1 | |
| (Phenylsulfinyl)Benzene SCHEMBL11455732 | 0.76 | TDP1 (0.35) | TDP1CYP3A4ALDH1A1TSHRCA1 | |
| (Phenylsulfinyl)Benzene SCHEMBL11889252 | 0.76 | TDP1 (0.35) | TDP1CYP3A4ALDH1A1TSHRCA1 | |
| (Phenylsulfinyl)Benzene SCHEMBL30226308 | 0.76 | TDP1 (0.35) | TDP1CYP3A4ALDH1A1TSHRCA1 | |
| (Phenylsulfinyl)Benzene SCHEMBL29381213 | 0.76 | TDP1 (0.35) | TDP1CYP3A4ALDH1A1TSHRCA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1105944-C | Method of obtaining a lift-off imaged pattern | CLARIENT INTERNAT CORP (CH) | 2003-04-16 | — | — | CN | claimed |
| CN-1181820-A | Method of obtaining a lift-off imaged pattern | CLARIENT INTERMATIONAL CORP (CH) | 1998-05-13 | — | — | CN | claimed |
| CN-104918985-B | Method for manufacturing sulfone polymer film | 索尔维公司 | 2019-08-09 | — | — | CN | disclosed |
| CN-106574139-B | Fluoropolymer composition | 索尔维特殊聚合物意大利有限公司 | 2019-03-22 | — | — | CN | disclosed |
| CN-106574139-A | Fluoropolymer composition | 索尔维特殊聚合物意大利有限公司 | 2017-04-19 | — | — | CN | disclosed |
| CN-1940726-B | Method for producing resin for chemically amplified positive resist | SUMITOMO SEIKA CHEMICALS | 2011-07-13 | — | — | CN | disclosed |
| CN-100503666-C | Hyperbranched polymer, method for producing same, and resist composition containing same | LION CORP (JP) | 2009-06-24 | — | — | CN | disclosed |
| CN-101180324-A | Polymerizable compound for photoresist, polymer thereof, and photoresist composition containing the polymer | IDEMITSU KOSAN CO (JP) | 2008-05-14 | — | — | CN | disclosed |
| CN-1940726-A | Method for producing resin for chemically amplified positive resist | SUMITOMO SEIKA CHEMICALS (JP) | 2007-04-04 | — | — | CN | disclosed |
| CN-1898281-A | Hyperbranched polymer, method for producing same, and resist composition containing same | LION CORP (JP) | 2007-01-17 | — | — | CN | disclosed |
| CN-1650161-A | Method for conducting automated surface inspection and surface correction | BASF AG (DE) | 2005-08-03 | — | — | CN | disclosed |
| WO-2005062811-A2 | CATALYTIC SULFOXIDE-PROMOTED C-H OXIDATION, AND REGIOSELECTIVE PREPARATION OF ALLYLIC CARBOXYLATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2005-07-14 | — | — | WO | disclosed |
| CN-1167982-C | Photoresist composition | 住友化学工业株式会社 | 2004-09-22 | — | — | CN | disclosed |
| CN-1105944-C | Method of obtaining a lift-off imaged pattern | CLARIENT INTERNAT CORP (CH) | 2003-04-16 | — | — | CN | disclosed |
| CN-1235281-A | Photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1999-11-17 | — | — | CN | disclosed |
| CN-1181820-A | Method of obtaining a lift-off imaged pattern | CLARIENT INTERMATIONAL CORP (CH) | 1998-05-13 | — | — | CN | disclosed |
| CN-1031562-A | BLEACHING COMPOSITION | KAO CORP (JP) | 1989-03-08 | — | — | CN | disclosed |
| US-4254208-A | DISPERSION, LIQUEFYING, SOLIDS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-03 | — | — | US | disclosed |