SCHEMBL6510174

SCHEMBL6510174

C=CC(=O)C(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15626616 1.00
SCHEMBL15314542 1.00
SCHEMBL1056648 0.80
SCHEMBL27546127 0.79
SCHEMBL27529372 0.79
SCHEMBL11051391 0.79
SCHEMBL822534 0.78
SCHEMBL820016 0.78
SCHEMBL6851442 0.77 TSHR (0.41)
SCHEMBL19566044 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4239000-A1 COMPOSITION FOR FORMING LOW DIELECTRIC CONSTANT RESIN, LOW DIELECTRIC MEMBER, AND ELECTRONIC DEVICE USING SAME JNC Corporation (JP) 2023-09-06 EP disclosed
EP-3085661-A1 METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2016-10-26 EP disclosed
US-9388255-B2 Oxygenation of vinyl-terminated macromonomers EXXONMOBIL CHEMICAL PATENTS INC. (US) 2016-07-12 US disclosed
EP-2484522-B1 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORP (JP) 2014-08-20 EP disclosed
US-20140088266-A1 Oxygenation of Vinyl-Terminated Macromonomers EXXONMOBIL CHEMICAL PATENTS INC. 2014-03-27 US disclosed
WO-2012124177-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR, PLATE MAKING METHOD THEREOF AND POLYVALENT ISOCYANATE COMPOUND FUJIFILM CORPORATION (JP) 2012-09-20 WO disclosed
EP-2484522-A2 Lithographic printing plate precursor and plate making method thereof FUJIFILM Corporation (JP) 2012-08-08 EP disclosed
CN-100535691-C Wavelength plate for laser optical system and preparation method thereof JSR CORP (JP) 2009-09-02 CN disclosed
CN-100468099-C Optical film, polarizing plate and liquid crystal display JSR CORP (JP) 2009-03-11 CN disclosed
CN-100437163-C Wave plate JSR CORP (JP) 2008-11-26 CN disclosed
EP-0937701-B1 Process for producing 2,2'-bis (hydroxymethyl) alkanoic acid NIPPON KASEI CHEM (JP) 2002-05-22 EP disclosed
EP-1179523-A1 Process for producing 2,2'-bis-(hydroxymethyl)alkanal and 2,2'-bis(hydroxymethyl)alkanoic acid Nippon Kasei Chemical Company Limited (JP) 2002-02-13 EP disclosed
EP-1046688-A1 Aqueous floor coating composition comprising acrylic resin and alkanolamine JSR Corporation (JP) 2000-10-25 EP disclosed
US-6072082-A REACTING ALIPHATIC ALDEHYDE WITH FORMALDEHYDE IN PRESENCE OF WATER SOLUBLE BASE, OXIDIZING HYDROXYMETHYLALKANAL TO ACID, RECOVERING ACID BY ADDING MINERAL ACID TO FORM SALT OF BASE, REPLACING WATER WITH ORGANIC SOLVENT, RECRYSTALLIZING ACID NIPPON KASEI CHEMICAL COMPANY (JP) 2000-06-06 US disclosed
US-5994592-A Process for producing 2,2'-bis(hydroxymethyl)alkanal and 2,2'-bis(hydroxymethyl)alkanoic acid NIPPON KASEI CHEMICAL COMPANY LIMITED (JP) 1999-11-30 US disclosed
EP-0937701-A1 Process for producing 2,2-bis (hydroxymethyl) alkanoic acid NIPPON KASEI CHEMICAL CO., LTD. (JP) 1999-08-25 EP disclosed
EP-0860419-A1 Process for producing 2,2'-bis (hydroxymethyl) alkanal and 2,2,'-bis (hydroxymethyl) - alkanoic acid Mitsubishi Chemical Corporation (JP) 1998-08-26 EP disclosed
US-4677230-A ISOMERIZATION USING RARE EARTH METAL, PALLADIUM CATALYST BASF AKTIENGESELLSCHAFT (DE) 1987-06-30 US disclosed
US-4547503-A 1-Cyclopropyl-6-fluoro-1,4-dihydro-4-oxo-7-[4-(oxo-alkyl)-1-piperazinyl]quinoline-3-carboxylic acids and their derivatives, and antibacterial agents containing them BAYER AKTIENGESELLSCHAFT (DE) 1985-10-15 US disclosed
US-3932573-A Process for producing glass fiber reinforced injection molding compounds ETHYL CORPORATION (US) 1976-01-13 US disclosed