⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1884878 | 1.00 | — | — | |
| SCHEMBL4918399 | 0.87 | — | — | |
| SCHEMBL4807859 | 0.87 | — | — | |
| SCHEMBL15412001 | 0.87 | — | — | |
| Lithium Ion SCHEMBL3972763 | 0.87 | — | — | |
| SCHEMBL4812095 | 0.87 | — | — | |
| SCHEMBL11654272 | 0.82 | — | — | |
| SCHEMBL34398 | 0.82 | — | — | |
| SCHEMBL21273333 | 0.82 | — | — | |
| SCHEMBL3467470 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 375 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240088207-A1 | CAPACITANCE STRUCTURE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-14 | — | — | US | claimed |
| US-11754917-B2 | Extreme ultraviolet mask blank with multilayer absorber and method of manufacture | APPLIED MATERIALS, INC. (US) | 2023-09-12 | — | — | US | claimed |
| US-11062946-B2 | Self-aligned contact on a semiconductor device | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2021-07-13 | — | — | US | claimed |
| US-11022876-B2 | Extreme ultraviolet mask blank with multilayer absorber and method of manufacture | APPLIED MATERIALS, INC. (US) | 2021-06-01 | — | — | US | claimed |
| US-10747102-B2 | Extreme ultraviolet mask blank with multilayer absorber and method of manufacture | APPLIED MATERIALS, INC. (US) | 2020-08-18 | — | — | US | claimed |
| US-10734508-B2 | Compound semiconductor device | ADVANTEST CORPORATION (JP) | 2020-08-04 | — | — | US | claimed |
| US-20200218145-A1 | Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture | APPLIED MATERIALS, INC. (US) | 2020-07-09 | — | — | US | claimed |
| US-20200152514-A1 | SELF-ALIGNED CONTACT ON A SEMICONDUCTOR DEVICE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2020-05-14 | — | — | US | claimed |
| CN-109799674-A | Mask and its manufacturing method for pole UV photoetching | IMEC 非营利协会 | 2019-05-24 | — | — | CN | claimed |
| CN-106276827-B | The method for preparing tantalum nitride oxide catalysis material using waste and old tantalum capacitor | 上海交通大学 | 2018-12-07 | — | — | CN | claimed |
| US-6884678-B2 | Method for forming capacitor of semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2005-04-26 | — | — | US | claimed |
| EP-1504462-A1 | COLOR CATHODE RAY TUBE WITH OPTICAL FILTER SYSTEM | Philips Intellectual Property & Standards GmbH (DE) | 2005-02-09 | — | — | EP | claimed |
| US-20050002227-A1 | Phase changeable memory devices including nitrogen and/or silicon and methods for fabricating the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-01-06 | — | — | US | claimed |
| US-20040251551-A1 | Phase changeable memory devices including carbon nano tubes and methods for forming the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-16 | — | — | US | claimed |
| US-20040183107-A1 | Phase changable memory device structures and related methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-09-23 | — | — | US | claimed |
| US-20040165422-A1 | Phase changeable memory devices and methods for fabricating the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-08-26 | — | — | US | claimed |
| US-20040110341-A1 | Method for forming capacitor of semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2004-06-10 | — | — | US | claimed |
| WO-2003094191-A1 | COLOR CATHODE RAY TUBE WITH OPTICAL FILTER SYSTEM | PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH (DE) | 2003-11-13 | — | — | WO | claimed |
| US-6156600-A | Method for fabricating capacitor in integrated circuit | UNITED MICROELECTRONICS CORP. (TW) | 2000-12-05 | — | — | US | claimed |
| US-5482799-A | Phase shift mask and manufacturing method thereof | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1996-01-09 | — | — | US | claimed |