SCHEMBL652832

SCHEMBL652832

C=CC(=O)OCC(C)CCCCCC

nearest known ligand 0.59

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.59
HPGD P15428 1/20 0.53
ACE2 Q9BYF1 1/20 0.46
ALDH1A1 P00352 1/20 0.44
CYP3A4 P08684 1/20 0.44
MAPT P10636 1/20 0.44
FAAH O00519 5/20 0.43
ZDHHC7 Q9NXF8 1/20 0.41
ABCB1 P08183 1/20 0.39
THRB P10828 2/20 0.39
CNR1 P21554 1/20 0.39
CNR2 P34972 1/20 0.39
ZDHHC20 Q5W0Z9 1/20 0.39
ZDHHC2 Q9UIJ5 1/20 0.39
THRA P10827 1/20 0.38
GPR84 Q9NQS5 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL651295 1.00 TSHR (0.59) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL27927889 1.00 TSHR (0.59) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL3764922 1.00 TSHR (0.59) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL11063165 1.00 TSHR (0.59) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL6451963 1.00 TSHR (0.59) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL28070583 1.00 TSHR (0.59) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL651685 1.00 TSHR (0.59) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL991726 0.98 TSHR (0.61) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL990755 0.93 TSHR (0.68) TSHRHPGDACE2ALDH1A1CYP3A4
SCHEMBL27646428 0.88 TSHR (0.61) TSHRHPGDACE2ALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112646417-A Quantum dot ink, preparation method of quantum dot light-emitting diode and display device 广东聚华印刷显示技术有限公司 2021-04-13 CN claimed
US-10150008-B1 Golf balls incorporating mixtures of a thermoplastic polymer and polymethyl methacrylate-based polymers ACUSHNET COMPANY (US) 2018-12-11 US claimed
US-20250361408-A1 COATING SYSTEM AND COATED ARTICLE SHERWIN WILLIAMS GUANGDONG NEW MAT CO LTD (CN) 2025-11-27 US disclosed
EP-4646467-A1 TWO-COMPONENT COATING COMPOSITION, AND ARTICLE MADE THEREFROM Valspar Coatings (Shanghai) Co. Ltd. (CN) 2025-11-12 EP disclosed
US-12460104-B2 Two-component waterborne polyurethane coating composition and low gloss coating formed therefrom Sherwin-Williams (Guangdong) New Material Co., Ltd. (CN) 2025-11-04 US disclosed
CN-119875019-A Aqueous emulsion, preparation method thereof, coating composition and product 宣伟(广东)新材料有限公司 2025-04-25 CN disclosed
WO-2025082420-A1 AQUEOUS EMULSION, METHOD FOR PREPARING THE SAME, COATING COMPOSITION AND ARTICLE GUANGDONG HUARUN PAINTS CO., LTD. (CN) 2025-04-24 WO disclosed
CN-118772748-A Thermosetting powder coating composition, preparation method thereof and application of thermosetting powder coating composition 帝兴树脂(昆山)有限公司 2024-10-15 CN disclosed
CN-118325445-A Two-component coating composition and articles made therefrom 威士伯涂料(上海)有限公司 2024-07-12 CN disclosed
WO-2024146484-A1 TWO-COMPONENT COATING COMPOSITION, AND ARTICLE MADE THEREFROM VALSPAR COATINGS (SHANGHAI) CO. LTD. (CN) 2024-07-11 WO disclosed
US-20220064479-A1 TWO-COMPONENT WATERBORNE POLYURETHANE COATING COMPOSITION AND LOW GLOSS COATING FORMED THEREFROM Sherwin-Williams (Guangdong) New Material Co., Ltd. (CN) 2022-03-03 US disclosed
US-7695813-B2 Core and shell particle for modifying impact resistance of a mouldable poly (meth) acrylate material ROEHM GMBH & CO. KG (DE) 2010-04-13 US disclosed
US-20090105399-A1 TRANSPARENT TPU (THERMOPLASTIC POLYURETHANES)/PMMA (POLYMETHYL (METH) ACRYLATE) BLENDS WITH IMPROVED LOW-TEMPERATURE IMPACT RESISTANCE EVONIK ROEHM GMBH (DE) 2009-04-23 US disclosed
US-20080132627-A1 Impact-Resistant Poly(Meth)Acrylate Moulding Masses With High Thermal Stability ROEHM GMBH (DE) 2008-06-05 US disclosed
US-20060147714-A1 Core and shell particle for modifying impact resistance of a mouldable poly (meth) acrylate material ROEHM GMBH & CO. KG (DE) 2006-07-06 US disclosed
US-20060052515-A1 Process for producing aqueou dispersions ROEHM GMBH & CO. KG (DE) 2006-03-09 US disclosed
EP-1167407-B1 VINYL CHLORIDE RESIN, PROCESS FOR PRODUCING THE SAME, AND MOLDED OBJECT SEKISUI CHEMICAL CO LTD (JP) 2005-11-09 EP disclosed
US-20040152821-A1 Polymer composition KANEKA CORPORATION (JP) 2004-08-05 US disclosed
US-6583221-B1 High impact resistance and a satisfactory surface condition; graft copolymerizing with an acrylic copolymer SEKISUI CHEMICAL CO., LTD. (JP) 2003-06-24 US disclosed
EP-1167407-A1 VINYL CHLORIDE RESIN, PROCESS FOR PRODUCING THE SAME, AND MOLDED OBJECT SEKISUI CHEMICAL CO., LTD. (JP) 2002-01-02 EP disclosed