Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIK3CD | O00329 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15182722 | 1.00 | PIK3CD (0.36) | PIK3CDCA2HSD17B10ALDH1A1 | |
| SCHEMBL31387038 | 1.00 | PIK3CD (0.36) | PIK3CDCA2HSD17B10ALDH1A1 | |
| SCHEMBL1298691 | 0.97 | — | — | |
| SCHEMBL17914309 | 0.88 | HSD17B10 (0.39) | HSD17B10ALDH1A1 | |
| SCHEMBL17914307 | 0.88 | HSD17B10 (0.39) | HSD17B10ALDH1A1 | |
| SCHEMBL1476482 | 0.88 | HSD17B10 (0.39) | HSD17B10ALDH1A1 | |
| SCHEMBL725089 | 0.88 | HSD17B10 (0.39) | HSD17B10ALDH1A1 | |
| SCHEMBL4373347 | 0.88 | HSD17B10 (0.39) | HSD17B10ALDH1A1 | |
| SCHEMBL8651797 | 0.88 | HSD17B10 (0.39) | HSD17B10ALDH1A1 | |
| SCHEMBL8390163 | 0.87 | HSD17B10 (0.34) | PIK3CDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106488917-B | Material for organic electroluminescent device | 默克专利有限公司 | 2020-05-05 | — | — | CN | disclosed |
| CN-111051294-A | Material for electronic devices | 默克专利有限公司 | 2020-04-21 | — | — | CN | disclosed |
| EP-1313744-A4 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECH MATERIALS (US) | 2004-03-31 | — | — | EP | disclosed |
| EP-1313744-A1 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-28 | — | — | EP | disclosed |
| WO-2002018394-A1 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-03-07 | — | — | WO | disclosed |
| EP-0873343-A4 | METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION | ADVANCED TECH MATERIALS (US) | 1999-12-15 | — | — | EP | disclosed |
| EP-0873343-A1 | METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1998-10-28 | — | — | EP | disclosed |
| WO-1996040690-A1 | METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1996-12-19 | — | — | WO | disclosed |