SCHEMBL6536700

SCHEMBL6536700

CC(O)N1CCOCC1.CN1CCOCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.37
KCNA5 P22460 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
PKM P14618 1/20 0.34
ALDH1A1 P00352 5/20 0.34
MAPT P10636 2/20 0.34
KMT2A Q03164 2/20 0.34
LMNA P02545 1/20 0.34
HPGD P15428 1/20 0.34
RAB9A P51151 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
CYP3A4 P08684 1/20 0.33
TSHR P16473 1/20 0.33
CYP2C19 P33261 1/20 0.33
KDM4E B2RXH2 2/20 0.31
CA12 O43570 1/20 0.31
CA7 P43166 1/20 0.31
CA14 Q9ULX7 1/20 0.31
KCNH2 Q12809 1/20 0.30
MEN1 O00255 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL134990 0.91
Hydrochloric Acid SCHEMBL11607003 0.88 USP2 (0.41) USP2KCNA5SMN1; SMN2PKMALDH1A1
SCHEMBL9694114 0.88 USP2 (0.46) USP2KCNA5SMN1; SMN2PKMALDH1A1
SCHEMBL29105480 0.88 USP2 (0.41) USP2KCNA5SMN1; SMN2PKMALDH1A1
SCHEMBL6266438 0.78 MC4R (0.41) ALDH1A1KMT2ALMNATSHRCYP2C19
SCHEMBL11313599 0.77 MAPT (0.38) USP2SMN1; SMN2PKMALDH1A1MAPT
Water SCHEMBL28001690 0.77
Methyl Alcohol SCHEMBL28612959 0.77
Hydrogen Peroxide SCHEMBL11793831 0.77
SCHEMBL4622 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824956-B2 ADDITION POLYMER CONTAINING UNITS OF AN ADAMANTYL ESTER HAVING HYDROXY GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2004-11-30 US disclosed
US-20030194640-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-10-16 US disclosed
EP-1338922-A2 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-08-27 EP disclosed