Silicate

Silicate

SCHEMBL6547776

O=[Si](O)O.[CaH2].[PbH2]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Silicate SCHEMBL6547206 0.94
Silicate SCHEMBL5877733 0.94
Silicate SCHEMBL9763231 0.94
Silicate SCHEMBL8006464 0.94
Silicate SCHEMBL8505390 0.94
Silicate SCHEMBL6881647 0.94
Silicate SCHEMBL15676632 0.94
Silicate SCHEMBL3689731 0.94
Silicate SCHEMBL10713915 0.94
Silicate SCHEMBL1259433 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0725109-B1 Stabilizer for chlorine-containing polymers, process for the preparation thereof and chlorine-containing polymer composition MIZUSAWA INDUSTRIAL CHEM (JP) 2004-12-01 EP disclosed
US-5769917-A Process for producing low shrink ceramic bodies RAGAN TECHNOLOGIES INC. 1998-06-23 US disclosed
US-5648413-A Stabilizer for chlorine-containing polymers, process for the preparation thereof and chlorine-containing polymer composition MIZUSAWA INDUSTRIAL CHEMICALS, INC. (JP) 1997-07-15 US disclosed
EP-0725109-A1 Stabilizer for chlorine-containing polymers, process for the preparation thereof and chlorine-containing polymer composition MIZUSAWA INDUSTRIAL CHEMICALS, LTD. (JP) 1996-08-07 EP disclosed
US-5518969-A MIXING GLASS AND REFRACTORY PARTICLES, COMPACTION, CONTROLLING PARTICLE SIZE RAGAN TECHNOLOGIES, INC. 1996-05-21 US disclosed