Trichloroacetic Acid

Trichloroacetic Acid

SCHEMBL6552197

O=C(O)C(Cl)(Cl)Cl.[Zn]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6420083-B1 EXCELLENT SENSITIVITY; DOES NOT REQUIRE WET DEVELOPMENT; HYDROPHILIC GROUPS IN POLYMER COORDINATE WITH THE POLYVALENT METAL CATION RELEASED BY HEAT AND FORM A HYDROPHOBIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 2002-07-16 US claimed
EP-1046496-A1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2000-10-25 EP claimed
EP-0331052-A2 Process for the preparation of imidized acrylic polymers ELF ATOCHEM ITALIA S.r.l. (IT) 1989-09-06 EP claimed
CN-118480174-A Aliphatic polycarbonate, preparation method and application thereof 中国科学院长春应用化学研究所 2024-08-13 CN disclosed
CN-115042488-B Ultrathin backboard and preparation method thereof 广东天跃新材料股份有限公司 2024-05-03 CN disclosed
CN-117917989-A Use of a reversible metal electrodeposited electrolyte with pH-adjustable, dynamic glass element with high opacity and excellent rest stability, and electrolyte useful therefor 代表内华达大学雷诺分校的内华达高等教育系统董事会 2024-04-23 CN disclosed
CN-115042488-A Ultrathin backboard and preparation method thereof 广东天跃新材料股份有限公司 2022-09-13 CN disclosed
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
EP-1046496-B1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO LTD (JP) 2004-02-18 EP disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed
US-6420083-B1 EXCELLENT SENSITIVITY; DOES NOT REQUIRE WET DEVELOPMENT; HYDROPHILIC GROUPS IN POLYMER COORDINATE WITH THE POLYVALENT METAL CATION RELEASED BY HEAT AND FORM A HYDROPHOBIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 2002-07-16 US disclosed
EP-1046496-A1 Planographic printing plate precursor containing metal compounds, and process for producing planographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 2000-10-25 EP disclosed
EP-0331052-A2 Process for the preparation of imidized acrylic polymers ELF ATOCHEM ITALIA S.r.l. (IT) 1989-09-06 EP disclosed
EP-0065025-A1 Preparation of carbamates from aromatic amines and organic carbonates THE DOW CHEMICAL COMPANY (US) 1982-11-24 EP disclosed
US-4268684-A ZINC, TIN OR COBALT COMPOUNDS AS ACID CATALYSTS THE DOW CHEMICAL COMPANY (US) 1981-05-19 US disclosed