SCHEMBL6552564

SCHEMBL6552564

CC(C)(C)[Si](C)(C)OC1CCCCC1

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PPM1D O15297 2/20 0.34
CYP19A1 P11511 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7335164 0.98 PPM1D (0.35) PPM1D
Methyl Alcohol SCHEMBL29180934 0.96 PPM1D (0.35) PPM1DCYP19A1
SCHEMBL29789152 0.93 PPM1D (0.38) PPM1D
Formaldehyde SCHEMBL19466565 0.91 PPM1D (0.35) PPM1DCYP19A1
SCHEMBL5975213 0.90 CYP19A1 (0.31) PPM1DCYP19A1
SCHEMBL5975217 0.90 CYP19A1 (0.31) PPM1DCYP19A1
SCHEMBL3860694 0.88 CYP19A1 (0.30) PPM1DCYP19A1
SCHEMBL3860695 0.88 CYP19A1 (0.30) PPM1DCYP19A1
SCHEMBL3862362 0.88 CYP19A1 (0.30) PPM1DCYP19A1
SCHEMBL3862365 0.88 CYP19A1 (0.30) PPM1DCYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0477359-B1 SYNTHESIS OF CYCLITOLS FROM SUBSTITUTED ARENE DIOLS VIRGINIA TECH INTELL PROP (US) 1995-07-05 EP claimed
US-12098261-B2 Near-infrared absorbing material fine particle dispersion body, near-infrared absorbing body, near-infrared absorbing substance laminated body and combined structure for near infrared absorption SUMITOMO METAL MINING CO., LTD. (JP) 2024-09-24 US disclosed
CN-118033001-A High performance liquid chromatography separation assay CALO-B1And method for impurity thereof 重庆华邦胜凯制药有限公司 2024-05-14 CN disclosed
US-20230305405-A1 COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed
CN-111699421-B Near-infrared-absorbing-material fine particle dispersion, near-infrared absorber, near-infrared-absorbing-material laminate, and near-infrared-absorbing sandwich structure 住友金属矿山株式会社 2023-03-24 CN disclosed
US-20210070961-A1 NEAR-INFRARED ABSORBING MATERIAL FINE PARTICLE DISPERSION BODY, NEAR-INFRARED ABSORBING BODY, NEAR-INFRARED ABSORBING SUBSTANCE LAMINATED BODY AND COMBINED STRUCTURE FOR NEAR INFRARED ABSORPTION SUMITOMO METAL MINING CO., LTD. (JP) 2021-03-11 US disclosed
EP-3558997-B1 AMINO-TRIAZOLOPYRIDINE COMPOUNDS AND THEIR USE IN TREATING CANCER ASTRAZENECA AB (SE) 2021-01-27 EP disclosed
CN-111699421-A Near-infrared-absorbing-material fine particle dispersion, near-infrared absorber, near-infrared-absorbing-material laminate, and near-infrared-absorbing sandwich structure 住友金属矿山株式会社 2020-09-22 CN disclosed
WO-2019155999-A1 NEAR INFRARED RAY ABSORPTION MATERIAL MICRO-PARTICLE DISPERSION, NEAR INFRARED RAY ABSORBER, NEAR INFRARED RAY ABSORPTION LAMINATE, COMBINED STRUCTURE FOR NEAR INFRARED RAY ABSORPTION 住友金属鉱山株式会社 2019-08-15 WO disclosed
EP-1094068-B1 Silylation of hydroxyl group-containing compounds SHINETSU CHEMICAL CO (JP) 2004-12-15 EP disclosed
EP-1210347-A1 CARBOCYCLIC NUCLEOSIDES AND PROCESS FOR OBTAINING SUCH Stichting REGA V.Z.W. (BE) 2002-06-05 EP disclosed
US-6239303-B1 USING RUTHENIUM COMPLEX CATALYST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-05-29 US disclosed
EP-1094068-A2 Silylation of hydroxyl group-containing compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-04-25 EP disclosed
WO-2001018003-A1 CARBOCYCLIC NUCLEOSIDES AND PROCESS FOR OBTAINING SUCH STICHTING REGA VZW (BE) 2001-03-15 WO disclosed
EP-0401837-B1 Silylating agent DOW CORNING TORAY SILICONE (JP) 1994-11-30 EP disclosed
US-5153343-A Methyl isopropyl hydrocarbyl halo silane; stability DOW CORNING TORAY SILICONE COMPANY, LTD. (JP) 1992-10-06 US disclosed
US-5136074-A Stable silylation product; easy desilylation DOW CORNING TORAY SILICONE COMPANY, LTD. (JP) 1992-08-04 US disclosed
EP-0401837-A2 Silylating agent Dow Corning Toray Silicone Company Ltd. (JP) 1990-12-12 EP disclosed
US-4748262-A (Phenyl dimethyl carbinyl) silane compound and a method for the preparation thereof SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-05-31 US disclosed