SCHEMBL6552567

SCHEMBL6552567

CC1(O[SiH](OC2(C)CCCCC2)C(C)(C)C)CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6905764 0.79
SCHEMBL1048978 0.79
SCHEMBL1054699 0.72
SCHEMBL6830150 0.72
SCHEMBL6830459 0.69
SCHEMBL8523129 0.68
SCHEMBL22462276 0.68 TSHR (0.33)
SCHEMBL4495155 0.67
SCHEMBL13949727 0.67
SCHEMBL9357177 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12098261-B2 Near-infrared absorbing material fine particle dispersion body, near-infrared absorbing body, near-infrared absorbing substance laminated body and combined structure for near infrared absorption SUMITOMO METAL MINING CO., LTD. (JP) 2024-09-24 US disclosed
US-20210070961-A1 NEAR-INFRARED ABSORBING MATERIAL FINE PARTICLE DISPERSION BODY, NEAR-INFRARED ABSORBING BODY, NEAR-INFRARED ABSORBING SUBSTANCE LAMINATED BODY AND COMBINED STRUCTURE FOR NEAR INFRARED ABSORPTION SUMITOMO METAL MINING CO., LTD. (JP) 2021-03-11 US disclosed
WO-2019155999-A1 NEAR INFRARED RAY ABSORPTION MATERIAL MICRO-PARTICLE DISPERSION, NEAR INFRARED RAY ABSORBER, NEAR INFRARED RAY ABSORPTION LAMINATE, COMBINED STRUCTURE FOR NEAR INFRARED RAY ABSORPTION 住友金属鉱山株式会社 2019-08-15 WO disclosed
EP-1094068-B1 Silylation of hydroxyl group-containing compounds SHINETSU CHEMICAL CO (JP) 2004-12-15 EP disclosed
US-6239303-B1 USING RUTHENIUM COMPLEX CATALYST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-05-29 US disclosed
EP-1094068-A2 Silylation of hydroxyl group-containing compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-04-25 EP disclosed