SCHEMBL6553308

SCHEMBL6553308

C=CC(=O)OC1CC2CCC1(C)C2(C)C.C=Cc1ccc(OC(=O)C(OC(C)OC2CCCCC2)c2ccc(C=C)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.41
ELANE P08246 2/20 0.41
MAPT P10636 3/20 0.39
KDM4E B2RXH2 1/20 0.39
GAA P10253 1/20 0.39
XBP1 P17861 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
KMT2A Q03164 3/20 0.35
MAPK1 P28482 2/20 0.35
CYP19A1 P11511 2/20 0.34
MEN1 O00255 2/20 0.33
LMNA P02545 2/20 0.33
ALDH1A1 P00352 1/20 0.32
CPB2 Q96IY4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5702429 0.78 CYP2C19 (0.47) CYP2C19ELANEMAPTKDM4EGAA
SCHEMBL6552990 0.77 CYP2C19 (0.38) CYP2C19ELANEMAPTKDM4EGAA
SCHEMBL6552992 0.76 CYP2C19 (0.40) CYP2C19ELANEMAPTKDM4EGAA
SCHEMBL6554995 0.75 CYP2C19 (0.48) CYP2C19ELANEMAPTKDM4EGAA
SCHEMBL6862732 0.74 CYP2C19 (0.53) CYP2C19ELANEMAPTKDM4EGAA
Styrene SCHEMBL6757449 0.73 CYP2C19 (0.71) CYP2C19ELANEMAPTKDM4EGAA
SCHEMBL6820750 0.73 KMT2A (0.51) CYP2C19ELANEMAPTKDM4EGAA
SCHEMBL6820749 0.73 KMT2A (0.51) CYP2C19ELANEMAPTKDM4EGAA
4-Vinylphenol SCHEMBL6555163 0.72 MAPT (0.48) CYP2C19ELANEMAPTKDM4EGAA
SCHEMBL6555166 0.72 CYP2C19 (0.50) CYP2C19ELANEMAPTKDM4EGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1059314-B1 A resist composition WAKO PURE CHEM IND LTD (JP) 2004-12-22 EP disclosed
US-6716573-B2 Resist Composition WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-06 US disclosed
US-20030039920-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-02-27 US disclosed
US-6432608-B1 FINENESS PATTERN WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2002-08-13 US disclosed
EP-1059314-A1 A resist composition Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed