Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | PRKCA | P17252 | 8/20 | 0.39 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.39 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.39 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 4/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16671474 | 0.87 | FFAR1 (0.46) | MAPTPRKCAPRKCEPRKCQPRKCD | |
| SCHEMBL15013202 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL15013126 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL15013115 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL1101084 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL15013151 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL15013159 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL15013098 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL15013130 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL253390 | 0.85 | MAPT (0.48) | MAPTMAPK1PRKCAPRKCEPRKCQ |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1398170-A2 | Pattern formation | Kodak Polychrome Graphics Company Ltd. (US) | 2004-03-17 | — | — | EP | claimed |
| EP-1024963-A1 | PATTERN FORMATION | Kodak Polychrome Graphics Company Ltd. (US) | 2000-08-09 | — | — | EP | claimed |
| WO-1999021725-A1 | PATTERN FORMATION | KODAK POLYCHROME GRAPHICS COMPANY LTD (US) | 1999-05-06 | — | — | WO | claimed |
| EP-0345016-B1 | Photosensitive composition and photosensitive lithographic printing plate | KONISHIROKU PHOTO IND (JP) | 1994-08-17 | — | — | EP | claimed |
| US-5238771-A | A blends of phenolic resins, polyoxyalkylene glycol sorbitol ether or fatty acid ester, polyoxypropylene glycol fatty acid ester or faty alcohol ether and modified polyoxyethylene glycol; chemical resistance | KONICA CORPORATION (JP) | 1993-08-24 | — | — | US | claimed |
| EP-0345016-A2 | Photosensitive composition and photosensitive lithographic printing plate | KONICA CORPORATION (JP) | 1989-12-06 | — | — | EP | claimed |
| EP-1400369-A2 | Pattern formation | Kodak Polychrome Graphics Company Ltd. (US) | 2004-03-24 | — | — | EP | disclosed |
| EP-1398170-A2 | Pattern formation | Kodak Polychrome Graphics Company Ltd. (US) | 2004-03-17 | — | — | EP | disclosed |
| US-6558869-B1 | Heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a developer resistance means for increasing the resistance of non-heated areas | KODAK POLYCHROME GRAPHICS LLC | 2003-05-06 | — | — | US | disclosed |
| US-6461795-B1 | APPLYING COMPOSITION COMPRISING PHENOLIC RESIN, COMPOUND WHICH REDUCES AQUEOUS ALKALINE DEVELOPER SOLUBILITY OF RESIN AND SOLVENT TO SUBSTRATE, DRYING, HEAT TREATING FOR AT LEAST 4 HOURS, WHEREIN SOLUBILITY IS NOT INCREASED BY UV RADIATION | KODAK POLYCHROME GRAPHICS LLC | 2002-10-08 | — | — | US | disclosed |
| EP-1024958-A1 | MANUFACTURE OF LITHOGRAPHIC PRINTING FORMS | HORSELL GRAPHIC INDUSTRIES LIMITED (GB) | 2000-08-09 | — | — | EP | disclosed |
| EP-1024963-A1 | PATTERN FORMATION | Kodak Polychrome Graphics Company Ltd. (US) | 2000-08-09 | — | — | EP | disclosed |
| WO-1999021725-A1 | PATTERN FORMATION | KODAK POLYCHROME GRAPHICS COMPANY LTD (US) | 1999-05-06 | — | — | WO | disclosed |
| WO-1999021715-A1 | MANUFACTURE OF LITHOGRAPHIC PRINTING FORMS | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 1999-05-06 | — | — | WO | disclosed |
| EP-0345016-B1 | Photosensitive composition and photosensitive lithographic printing plate | KONISHIROKU PHOTO IND (JP) | 1994-08-17 | — | — | EP | disclosed |
| US-5238771-A | A blends of phenolic resins, polyoxyalkylene glycol sorbitol ether or fatty acid ester, polyoxypropylene glycol fatty acid ester or faty alcohol ether and modified polyoxyethylene glycol; chemical resistance | KONICA CORPORATION (JP) | 1993-08-24 | — | — | US | disclosed |
| EP-0345016-A2 | Photosensitive composition and photosensitive lithographic printing plate | KONICA CORPORATION (JP) | 1989-12-06 | — | — | EP | disclosed |
| US-4140115-A | Pressure sensitive adhesive compositions for coating articles to be attached to skin | JOHNSON & JOHNSON (US) | 1979-02-20 | — | — | US | disclosed |