SCHEMBL6561545

SCHEMBL6561545

CO[Si](OC)(OC)C(F)(F)C(F)(F)C(F)(F)C(C)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL159268 0.93
SCHEMBL4864205 0.91
SCHEMBL206746 0.91
SCHEMBL205691 0.91
SCHEMBL1322269 0.91
SCHEMBL6051778 0.86
SCHEMBL6562523 0.77
SCHEMBL20378727 0.77
SCHEMBL5367093 0.74
SCHEMBL20378707 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112708139-A Fluorine-containing polyphenyl silicon boron flame retardant and preparation method thereof 铨盛聚碳科技股份有限公司 2021-04-27 CN claimed
CN-111081470-B Polyimide capacitor 南京中鸿润宁新材料科技有限公司 2020-11-13 CN claimed
CN-111825839-A Low-dielectric polyimide, preparation method thereof and low-dielectric polyimide film 南京中鸿润宁新材料科技有限公司 2020-10-27 CN claimed
CN-111303414-A High-performance low-dielectric polyimide, preparation method thereof and high-performance low-dielectric polyimide film 南京中鸿润宁新材料科技有限公司 2020-06-19 CN claimed
CN-111205643-A Transparent polyimide film and preparation method thereof 无锡创彩光学材料有限公司 2020-05-29 CN claimed
CN-111205644-A High-transparency high-heat-resistance polyimide film and preparation method thereof 无锡创彩光学材料有限公司 2020-05-29 CN claimed
CN-111081470-A Polyimide capacitor 南京中鸿润宁新材料科技有限公司 2020-04-28 CN claimed
CN-111073019-A Surface hydrophobic modification method of flexible organic polymer substrate 北京市理化分析测试中心 2020-04-28 CN claimed
US-10501583-B2 Method for preparing polyhedral oligomeric silsesquioxane LG CHEM, LTD. (KR) 2019-12-10 US claimed
US-20180201734-A1 METHOD FOR PREPARING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE LG CHEM, LTD. (KR) 2018-07-19 US claimed
EP-0790522-B1 Process for forming a liquid crystal vertical alignment film NISSAN CHEMICAL IND LTD (JP) 2004-03-24 EP claimed
US-5766673-A POLYSILOXANES MODIFIED WITH AN ALCOHOL AND OXALIC ACID NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1998-06-16 US claimed
EP-0790522-A1 Process for forming a liquid crystal vertical alignment film NISSAN CHEMICAL INDUSTRIES LTD. (JP) 1997-08-20 EP claimed
CN-112708139-A Fluorine-containing polyphenyl silicon boron flame retardant and preparation method thereof 铨盛聚碳科技股份有限公司 2021-04-27 CN disclosed
CN-111081470-B Polyimide capacitor 南京中鸿润宁新材料科技有限公司 2020-11-13 CN disclosed
CN-111825839-A Low-dielectric polyimide, preparation method thereof and low-dielectric polyimide film 南京中鸿润宁新材料科技有限公司 2020-10-27 CN disclosed
US-5766673-A POLYSILOXANES MODIFIED WITH AN ALCOHOL AND OXALIC ACID NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1998-06-16 US disclosed
EP-0790522-A1 Process for forming a liquid crystal vertical alignment film NISSAN CHEMICAL INDUSTRIES LTD. (JP) 1997-08-20 EP disclosed
US-4997738-A Electrophotographic photoreceptor having silicate with perfluoroalkyl groups in protective layer SHINDENGEN ELECTRIC MANUFACTURING CO., LTD. (JP) 1991-03-05 US disclosed
US-4024306-A ORGANOTRI-TETRA ALKOXYSILANE SHIN-ETSU CHEMICAL COMPANY LIMITED (JA) 1977-05-17 US disclosed