SCHEMBL6562990

SCHEMBL6562990

Clc1ccc(-c2ccc(Cl)c(-c3ccccc3)c2)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.62
MAP4K4 O95819 1/20 0.54
CYP2A6 P11509 1/20 0.52
ESR2 Q92731 1/20 0.48
KDM4E B2RXH2 2/20 0.46
HTT P42858 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
ALDH1A1 P00352 1/20 0.46
POLB P06746 1/20 0.46
AHR P35869 2/20 0.45
CNR1 P21554 1/20 0.44
SLC6A9 P48067 1/20 0.43
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
LMNA P02545 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
GAA P10253 1/20 0.42
APAF1 O14727 1/20 0.42
NPC1 O15118 1/20 0.42
MAPT P10636 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22544432 0.94 CYP2A6 (0.58) CYP1A2MAP4K4CYP2A6ESR2HTT
SCHEMBL20955807 0.94 CYP2A6 (0.58) CYP1A2MAP4K4CYP2A6ESR2HTT
SCHEMBL29935106 0.94 CYP2A6 (0.58) CYP1A2MAP4K4CYP2A6ESR2HTT
SCHEMBL29778098 0.94 CYP2A6 (0.58) CYP1A2MAP4K4CYP2A6ESR2HTT
SCHEMBL29028999 0.89 CYP1A2 (0.58) CYP1A2MAP4K4CYP2A6ESR2KDM4E
SCHEMBL24780966 0.89 CYP2A6 (0.54) CYP1A2MAP4K4CYP2A6ESR2KDM4E
SCHEMBL28976272 0.89 CYP2A6 (0.54) CYP1A2MAP4K4CYP2A6ESR2HTT
SCHEMBL19785362 0.87 ESR2 (0.56) CYP1A2MAP4K4CYP2A6ESR2KDM4E
SCHEMBL24999271 0.85 CYP1A2 (0.65) CYP1A2MAP4K4CYP2A6ESR2KDM4E
SCHEMBL25246242 0.85 CYP1A2 (0.65) CYP1A2MAP4K4CYP2A6ESR2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed