SCHEMBL6563690

SCHEMBL6563690

CCC(C)B(C(C)CC)C(C)CC.[HH]

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL332719 0.96 TSHR (0.38) TSHR
SCHEMBL476435 0.92 TSHR (0.35) TSHR
SCHEMBL10535072 0.92 TSHR (0.35) TSHR
SCHEMBL43618 0.92 TSHR (0.35) TSHR
SCHEMBL312679 0.92 TSHR (0.35) TSHR
Ammonia Solution, Strong SCHEMBL19874799 0.92 TSHR (0.35) TSHR
Water SCHEMBL2717905 0.89 TSHR (0.33) TSHR
Lithium Ion SCHEMBL22445007 0.89 TSHR (0.33) TSHR
SCHEMBL1800340 0.89 TSHR (0.33) TSHR
Potassium Ion SCHEMBL952692 0.89 TSHR (0.33) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 WO disclosed
EP-1085009-B1 INDAN DERIVATIVES NISSAN CHEMICAL IND LTD (JP) 2004-11-10 EP disclosed
US-6486178-B1 Indane derivatives NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2002-11-26 US disclosed
EP-1085009-A1 INDAN DERIVATIVES Nissan Chemical Industries, Ltd. (JP) 2001-03-21 EP disclosed