SCHEMBL6564082

SCHEMBL6564082

CO[SiH](OC)C(C)C#Cc1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.41
HTR2A P28223 1/20 0.39
SIGMAR1 Q99720 1/20 0.35
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
MTOR P42345 1/20 0.34
GRM5 P41594 2/20 0.34
KCNH2 Q12809 2/20 0.34
FFAR1 O14842 1/20 0.34
MEN1 O00255 1/20 0.34
POLB P06746 1/20 0.34
KMT2A Q03164 1/20 0.34
NLRP3 Q96P20 1/20 0.34
PDGFRB P09619 1/20 0.34
PDGFRA P16234 1/20 0.34
CA4 P22748 1/20 0.33
MAPT P10636 1/20 0.33
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33
MMP3 P08254 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6562911 0.80 HTR2A (0.40) APPHTR2ASIGMAR1FFAR1KMT2A
SCHEMBL6562936 0.78 FFAR1 (0.40) APPHTR2ANPC1RAB9AGRM5
SCHEMBL28242920 0.73 APP (0.50) APPHTR2ASIGMAR1NPC1RAB9A
SCHEMBL3031415 0.72 APP (0.55) APPHTR2ASIGMAR1NPC1RAB9A
SCHEMBL4730312 0.70 HTR2A (0.57) APPHTR2ASIGMAR1NPC1RAB9A
SCHEMBL31596105 0.69 APP (0.46) APPHTR2ASIGMAR1NPC1RAB9A
SCHEMBL1657802 0.69 APP (0.50) APPHTR2ASIGMAR1NPC1RAB9A
Hydrochloric Acid SCHEMBL21803715 0.69 HTR2A (0.55) APPHTR2ASIGMAR1NPC1RAB9A
SCHEMBL1657799 0.69 APP (0.50) APPHTR2ASIGMAR1NPC1RAB9A
SCHEMBL28901305 0.69 APP (0.50) APPHTR2ASIGMAR1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed