⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2875191 | 0.72 | — | — | |
| SCHEMBL14627912 | 0.70 | — | — | |
| SCHEMBL25975095 | 0.70 | — | — | |
| SCHEMBL15153951 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL29047223 | 0.68 | — | — | |
| Hydrochloric Acid SCHEMBL29047229 | 0.68 | — | — | |
| SCHEMBL1164837 | 0.67 | — | — | |
| SCHEMBL9853 | 0.67 | — | — | |
| SCHEMBL28166072 | 0.67 | — | — | |
| SCHEMBL5146 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040191672-A1 | Resist composition | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| EP-1443362-A2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-08-04 | — | — | EP | disclosed |
| CN-1517794-A | Resist composition | 三菱瓦斯化学株式会社 | 2004-08-04 | — | — | CN | disclosed |