⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Thiocyanic Acid SCHEMBL9001587 | 1.00 | — | — | |
| Thiocyanic Acid SCHEMBL18153982 | 0.87 | CA1 (1.00) | — | |
| Thiocyanic Acid SCHEMBL435605 | 0.87 | — | — | |
| Thiocyanic Acid SCHEMBL10574263 | 0.87 | — | — | |
| Thiocyanic Acid SCHEMBL8543600 | 0.87 | — | — | |
| Thiocyanic Acid SCHEMBL27817549 | 0.87 | — | — | |
| Thiocyanic Acid SCHEMBL22439 | 0.87 | — | — | |
| Thiocyanic Acid SCHEMBL8900 | 0.87 | — | — | |
| Thiocyanic Acid SCHEMBL6298414 | 0.87 | — | — | |
| Thiocyanic Acid SCHEMBL2359454 | 0.87 | CA1 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110668824-A | Photocuring 3D printing silicon nitride ceramic precursor, and preparation and forming methods thereof | 西安交通大学 | 2020-01-10 | — | — | CN | claimed |
| JP-62168599-A | — | — | None | — | — | JP | disclosed |
| US-20250179235-A1 | Cross-linked Nanoporous Saccharide-based Material and Methods for Fabrication Thereof | NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) | 2025-06-05 | — | — | US | disclosed |
| CN-118084512-B | Preparation method and application of photo-curable silicon nitride ceramic slurry | 山东理工大学 | 2024-06-21 | — | — | CN | disclosed |
| CN-118084512-A | Preparation method and application of photo-curable silicon nitride ceramic slurry | 山东理工大学 | 2024-05-28 | — | — | CN | disclosed |
| US-20210122875-A1 | Cross-linked Nanoporous Saccharide-based Material and Methods for Fabrication Thereof | NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) | 2021-04-29 | — | — | US | disclosed |
| WO-2020011197-A1 | CROSS-LINKED NANOPOROUS SACCHARIDE-BASED MATERIAL AND METHODS FOR FABRICATION THEREOF | NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (CN) | 2020-01-16 | — | — | WO | disclosed |
| CN-110668824-A | Photocuring 3D printing silicon nitride ceramic precursor, and preparation and forming methods thereof | 西安交通大学 | 2020-01-10 | — | — | CN | disclosed |
| CN-110668824-A | Photocuring 3D printing silicon nitride ceramic precursor, and preparation and forming methods thereof | 西安交通大学 | 2020-01-10 | — | — | CN | disclosed |
| CN-102341186-B | Electronic devices comprising structured organic films | 施乐公司 | 2017-09-29 | — | — | CN | disclosed |
| CN-102341187-B | Via the method for pre- SOF preparation structures organic film (SOF) | 施乐公司 | 2017-09-29 | — | — | CN | disclosed |
| EP-1120435-B1 | APPARATUS AND METHOD FOR PRODUCING RESIN | TEIJIN LTD (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-6562936-B1 | Resin excellent in hydrolysis and heat stability such as a reduction in molecular weight at the time of molding and color retention and moldability such as releasability and transferability, rarely experiences residence deterioration | TEIJIN LIMITED (JP) | 2003-05-13 | — | — | US | disclosed |
| US-6509435-B1 | Heat resistance, stability; moldings | TEIJIN LIMITED (JP) | 2003-01-21 | — | — | US | disclosed |
| EP-1191049-A1 | POLYCARBONATE, PROCESS FOR PRODUCING THE SAME, AND MOLDED ARTICLE THEREOF | TEIJIN LIMITED (JP) | 2002-03-27 | — | — | EP | disclosed |
| EP-1120435-A1 | APPARATUS AND METHOD FOR PRODUCING RESIN | TEIJIN LIMITED (JP) | 2001-08-01 | — | — | EP | disclosed |
| EP-1059033-A1 | INDUSTRIAL ANTIBACTERIAL/ANTIFUNGAL AGENTS, ALGICIDES AND ANTI-BIOLOGICAL ADHESION AGENTS CONTAINING BENZYLAMINES | Nissan Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| US-6153648-A | Iodopropargylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-1016649-A1 | IODOPROPAGYLAMINE COMPOUNDS, AND INDUSTRIAL ANTIMICROBIAL AND ANTIFUNGAL AGENTS, ALGICIDES, AND ANTIFOULING AGENTS CONTAINING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2000-07-05 | — | — | EP | disclosed |
| JP-S62168599-A | CONCENTRATING PROCESS FOR ORGANIC SLUDGE | KURITA WATER IND LTD | 1987-07-24 | — | — | JP | disclosed |