SCHEMBL6575868

SCHEMBL6575868

COc1cc(N)ccc1N=Nc1ccccc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 7/20 0.60
TDP1 Q9NUW8 5/20 0.60
ALDH1A1 P00352 5/20 0.60
CYP3A4 P08684 4/20 0.60
TSHR P16473 3/20 0.60
SMN1; SMN2 Q16637 3/20 0.60
TP53 P04637 1/20 0.60
MEN1 O00255 9/20 0.50
KMT2A Q03164 9/20 0.50
MAPT P10636 8/20 0.50
HTT P42858 2/20 0.50
PKM P14618 2/20 0.50
RAB9A P51151 1/20 0.50
L3MBTL1 Q9Y468 2/20 0.45
NPC1 O15118 1/20 0.45
HBB P68871 2/20 0.44
CYP1A2 P05177 2/20 0.44
CYP2C9 P11712 2/20 0.44
CYP2C19 P33261 2/20 0.44
HIF1A Q16665 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6575866 1.00 MAPK1 (0.60) MAPK1TDP1ALDH1A1CYP3A4TSHR
Hydrochloric Acid SCHEMBL15881171 0.98 MAPK1 (0.63) MAPK1TDP1ALDH1A1CYP3A4TSHR
Hydrochloric Acid SCHEMBL15881172 0.98 MAPK1 (0.63) MAPK1TDP1ALDH1A1CYP3A4TSHR
SCHEMBL5720614 0.90 MAPT (0.50) MAPK1TDP1ALDH1A1CYP3A4TSHR
SCHEMBL5720615 0.90 MAPT (0.50) MAPK1TDP1ALDH1A1CYP3A4TSHR
SCHEMBL11649428 0.89 MEN1 (0.49) MAPK1TDP1ALDH1A1CYP3A4TSHR
SCHEMBL11649424 0.89 MEN1 (0.49) MAPK1TDP1ALDH1A1CYP3A4TSHR
SCHEMBL9613402 0.88 MAPT (0.53) MAPK1TDP1ALDH1A1CYP3A4TSHR
SCHEMBL11684167 0.88 MAPT (0.53) MAPK1TDP1ALDH1A1CYP3A4TSHR
SCHEMBL11779529 0.86 KMT2A (0.56) MAPK1TDP1ALDH1A1CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1152037-B1 SQUARYLIUM COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME KYOWA HAKKO KOGYO KK (JP) 2004-05-19 EP disclosed
US-6599605-B2 Digital versatile disc high density recording layer KYOWA HAKKO KOGYO CO., LTD. (JP) 2003-07-29 US disclosed
US-20030082329-A1 Squarylium compounds and optical recording media using the same KYOWA HAKKO CHEMICAL CO., LTD. (FORMERLY KYOWA YUKA CO., LTD.) (JP) 2003-05-01 US disclosed
EP-1152037-A9 SQUARYLIUM COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME KYOWA HAKKO KOGYO CO., LTD. (JP) 2002-02-27 EP disclosed
EP-1152037-A1 SQUARYLIUM COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME KYOWA HAKKO KOGYO CO., LTD. (JP) 2001-11-07 EP disclosed
EP-0808884-A2 Heat curable two-component lacquer Feinchemie GmbH Sebnitz (DE) 1997-11-26 EP disclosed
EP-0046729-B1 PROCESS FOR THE MASS COLOURING OF POLYAMIDE FIBRES WITH AZO DYESTUFFS CIBA-GEIGY AG (CH) 1984-12-19 EP disclosed
EP-0062825-A2 Water-soluble triazine compounds, their preparation and their use BAYER AG (DE) 1982-10-20 EP disclosed
EP-0046729-A2 Process for the mass colouring of polyamide fibres with azo dyestuffs CIBA-GEIGY AG (CH) 1982-03-03 EP disclosed
US-4225493-A FOR POLYAMIDES BAYER AKTIENGESELLSCHAFT (DE) 1980-09-30 US disclosed
US-3956264-A Basic azo dyestuffs having indolyl-methyleneamino substituent in the diazo component BAYER AKTIENGESELLSCHAFT (DT) 1976-05-11 US disclosed